Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15955988 | 0.86 | CTDSP1 (0.37) | ALDH1A1CTDSP1CA2 | |
| SCHEMBL15955749 | 0.85 | CTDSP1 (0.36) | ALDH1A1CTDSP1CA2 | |
| SCHEMBL924281 | 0.85 | ALDH1A1 (0.59) | ALDH1A1TSHRCTDSP1CYP3A4CYP2D6 | |
| SCHEMBL10617645 | 0.83 | ALDH1A1 (0.58) | ALDH1A1TSHRCTDSP1CYP3A4CYP2D6 | |
| SCHEMBL774725 | 0.83 | TSHR (0.41) | ALDH1A1TSHRCTDSP1CA2 | |
| SCHEMBL15956025 | 0.82 | CTDSP1 (0.40) | ALDH1A1CTDSP1CA2 | |
| SCHEMBL15955777 | 0.82 | CTDSP1 (0.38) | ALDH1A1CTDSP1CA2 | |
| SCHEMBL1766032 | 0.82 | ALDH1A1 (0.52) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL10931558 | 0.81 | ALDH1A1 (0.55) | ALDH1A1TSHRCTDSP1CYP3A4CYP2D6 | |
| SCHEMBL21525856 | 0.81 | CTDSP1 (0.34) | ALDH1A1CTDSP1CYP3A4CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023248976-A1 | POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME | 株式会社日本触媒 | 2023-12-28 | — | — | WO | disclosed |
| WO-2023162889-A1 | POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION THEREOF | 株式会社日本触媒 | 2023-08-31 | — | — | WO | disclosed |
| EP-4183845-A1 | INK SET FOR RECORDING SECURITY IMAGE, SECURITY IMAGE RECORDING METHOD, AND SECURITY IMAGE RECORD | FUJIFILM Corporation (JP) | 2023-05-24 | — | — | EP | disclosed |
| US-20230106861-A1 | INK SET FOR SECURITY IMAGE RECORDING, SECURITY IMAGE RECORDING METHOD, AND ARTICLE WITH RECORDED SECURITY IMAGE | FUJIFILM CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| EP-2980610-B1 | OPTICAL FILM PRODUCTION METHOD AND OPTICAL FILM PRODUCTION DEVICE | MITSUBISHI CHEM CORP (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-10175576-B2 | Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2019-01-08 | — | — | US | disclosed |
| US-10174905-B2 | Optical film production method, optical film, surface light-emitting body and optical film production device | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-01-08 | — | — | US | disclosed |
| US-20180273778-A1 | RADIATION CURING TYPE INK JET INK COMPOSITION AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2018-09-27 | — | — | US | disclosed |
| EP-3309216-A1 | THERMOPLASTIC RESIN COMPOSITION, MOLDED ARTICLE, METHOD OF MANUFACTURING MOLDED ARTICLE, AND EXTERIOR MATERIAL FOR VEHICLE | Mitsubishi Chemical Corporation (JP) | 2018-04-18 | — | — | EP | disclosed |
| US-9903986-B2 | Light extraction film for EL elements, surface light emitting body, and method for producing light extraction film for EL elements | MITSUBISHI CHEMICAL CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| CN-102213918-A | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2011-10-12 | — | — | CN | disclosed |
| US-20110009586-A1 | POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE | NIPPON SHOKUBAI CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| CN-101609256-A | Diaphragm forms the formation method with radiation sensitive linear resin composition and diaphragm | JSR CORP (JP) | 2009-12-23 | — | — | CN | disclosed |
| CN-101546119-A | Radiation sensitive resin composition, division article, preparation method and liquid crystal display element | JSR CORP (JP) | 2009-09-30 | — | — | CN | disclosed |
| US-20090027608-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIN TRANSFER FILM, AND METHOD FOR PRODUCING A PHOTOSPACER, AND SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |
| US-7294732-B2 | Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers | CHISSO CORPORATION (JP) | 2007-11-13 | — | — | US | disclosed |
| US-7172851-B2 | Light sensitive composition, planographic printing plate material, and image formation method | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2007-02-06 | — | — | US | disclosed |
| US-7172851-B2 | Light sensitive composition, planographic printing plate material, and image formation method | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2007-02-06 | — | — | US | disclosed |
| US-20050288468-A1 | Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers | JNC CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| EP-1548020-A1 | SILICON COMPOUND | CHISSO CORPORATION (JP) | 2005-06-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050288468-A1 | Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers | STS, SULT1A1, SRM | ALDH1A1 384/4885TSHR 3372/4885CTDSP1 1109/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.