SCHEMBL7747591

SCHEMBL7747591

C=CC[Si](C)(C)C.CC(=CC(C)(C)C)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butadiene SCHEMBL1171833 0.78 GRIK1 (0.34) GRIK1
SCHEMBL27166 0.78 GRIK1 (0.39) GRIK1
SCHEMBL22811 0.78 GRIK1 (0.39) GRIK1
Pivalate SCHEMBL7193606 0.77 TSHR (0.32)
Acrylic Acid SCHEMBL30853652 0.77 LMNA (0.46) GRIK1
Bicarbonate SCHEMBL28964189 0.76 LMNA (0.33)
SCHEMBL8817785 0.75 ALDH1A1 (0.43) GRIK1
Methacrylic Acid SCHEMBL4205581 0.74 GRIK1 (0.34) GRIK1
Methacrylic Acid SCHEMBL4205585 0.74 GRIK1 (0.34) GRIK1
Oxirane SCHEMBL1904927 0.72 GRIK1 (0.33) GRIK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2001022162-A2 RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2001-03-29 WO disclosed