SCHEMBL774855

SCHEMBL774855

C=CC(=O)OCC(=O)N1C(=O)CCCC1OC(C)=O

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
F2 P00734 1/20 0.31
TSHR P16473 1/20 0.31
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775156 0.96 CYP2D6 (0.31) F2
SCHEMBL775283 0.94 F2 (0.32) F2TSHRCHRM2CHRM4CHRM1
SCHEMBL775031 0.86 F2 (0.35) F2TSHR
SCHEMBL775402 0.84 ALDH1A1 (0.36) F2TSHRCHRM2CHRM4CHRM1
SCHEMBL775403 0.82 TSHR (0.33) TSHR
SCHEMBL774869 0.80 ALDH1A1 (0.35) F2CHRM2CHRM4CHRM1CHRM3
SCHEMBL12764305 0.80 CHRM2 (0.35) CHRM2CHRM4CHRM1CHRM3
SCHEMBL774863 0.77 ALDH1A1 (0.37) F2TSHRCHRM2CHRM4CHRM1
SCHEMBL12764329 0.76 CHRM2 (0.34) CHRM2CHRM4CHRM1CHRM3
SCHEMBL774864 0.75 TSHR (0.33) F2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed