SCHEMBL775283

SCHEMBL775283

C=CC(=O)OCC(=O)N1C(=O)CCC1OC(C)=O

nearest known ligand 0.34

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
F2 P00734 1/20 0.32
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
TSHR P16473 1/20 0.30
FAAH O00519 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL774855 0.94 F2 (0.31) F2CHRM2CHRM4CHRM1CHRM3
SCHEMBL775156 0.93 CYP2D6 (0.31) F2
SCHEMBL775403 0.88 TSHR (0.33) TSHR
SCHEMBL775031 0.87 F2 (0.35) F2TSHRFAAH
SCHEMBL774863 0.83 ALDH1A1 (0.37) F2CHRM2CHRM4CHRM1CHRM3
SCHEMBL12764307 0.79 CHRM2 (0.36) CHRM2CHRM4CHRM1CHRM3
SCHEMBL775402 0.77 ALDH1A1 (0.36) F2CHRM2CHRM4CHRM1CHRM3
SCHEMBL774869 0.76 ALDH1A1 (0.35) F2CHRM2CHRM4CHRM1CHRM3
SCHEMBL774864 0.76 TSHR (0.33) F2TSHR
SCHEMBL9916010 0.74 TSHR (0.33) CHRM2CHRM4CHRM1CHRM3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed