SCHEMBL774864

SCHEMBL774864

C=CC(=O)OCC(=O)N1C(=O)CC1OC

nearest known ligand 0.33

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.33
HPGD P15428 1/20 0.33
ALDH1A1 P00352 3/20 0.32
TP53 P04637 2/20 0.32
HIF1A Q16665 2/20 0.32
F2 P00734 1/20 0.32
CYP3A4 P08684 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775403 0.87 TSHR (0.33) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL775031 0.86 F2 (0.35) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9916010 0.84 TSHR (0.33) TSHRHPGD
SCHEMBL774859 0.80 ALDH1A1 (0.36) TSHRALDH1A1F2
SCHEMBL775154 0.80 F2 (0.34) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL12764300 0.77 GSK3B (0.35)
SCHEMBL775283 0.76 F2 (0.32) TSHRF2
SCHEMBL774855 0.75 F2 (0.31) TSHRF2
SCHEMBL775156 0.74 CYP2D6 (0.31) F2
SCHEMBL775271 0.71 TDP1 (0.41) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed