Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3958924 | 0.86 | KMT2A (0.35) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL65803 | 0.86 | KMT2A (0.39) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL244365 | 0.84 | KMT2A (0.47) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140981 | 0.84 | CA1 (0.37) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140329 | 0.83 | KMT2A (0.35) | KMT2ACA1CA2CA4 | |
| SCHEMBL686204 | 0.83 | CA1 (0.45) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL685962 | 0.81 | KMT2A (0.42) | KMT2ACA1CA2CA4 | |
| SCHEMBL3965098 | 0.80 | ALDH1A1 (0.41) | CA1CA2MAPTKDM4EHSD17B10 | |
| SCHEMBL4203256 | 0.79 | KMT2A (0.33) | KMT2ACA1CA2CA4 | |
| SCHEMBL64538 | 0.79 | ALDH1A1 (0.40) | KMT2ACA1CA2MAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6329125-B2 | AN ALKALI-INSOLUBLE COMPOUND HAVING A PROTECTED ALKALI SOLUBLE GROUP IN WHICH PROTECTIVE GROUP CONTAINS AN ALICYCLIC HYDROCARBON GROUP HAVING BONDED TO A CARBON ATOM AND CLEAVED UPON ACTION OF AN ACID GENERATED FROM A PHOTOACID GEENERATOR | FUJITSU LIMITED (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010003640-A1 | Chemically amplified resist compositions and process for the formation of resist patterns | FUJITSU LIMITED (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6200725-B1 | A SUBSTITUTED ALICYCLIC HYDROCARBON GROUP WHICH ACTS AS A PROTECTIVE GROUP TO AN ADDITIONAL POLYMER WHEN EXPOSED TO A POLYACID GENERATOR WHICH IS CAPABLE OF DECOMPOSING TO PATTERN RADIATION EPOSURE, PRODUCES ACID, CAPABLE OF DEPROTECTION | FUJITSU LIMITED (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | disclosed |
| US-5968713-A | ALKALI DEVELOPED RESISTS AND FILM FORMING COMPOUNDS WITH ALKALI SOLUBLE GROUPS AND GENERATION | FUJITSU LIMITED (JP) | 1999-10-19 | — | — | US | disclosed |