SCHEMBL7750640

SCHEMBL7750640

C[SiH](C)[SiH](C)C1CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8381358 0.87 ALDH1A1 (0.30)
SCHEMBL8385657 0.75
SCHEMBL5477820 0.73 CES2 (0.33)
SCHEMBL5468555 0.73 CES2 (0.33)
SCHEMBL6027162 0.73 CES2 (0.33)
SCHEMBL6026907 0.73 CES2 (0.33)
SCHEMBL3771984 0.73 CES2 (0.33)
SCHEMBL456612 0.73
SCHEMBL5478088 0.73 CES2 (0.33)
SCHEMBL5461637 0.73 CES2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0697630-B1 X-ray mask support CANON KK (JP) 2001-01-03 EP disclosed
EP-0310124-B1 Process for producing an X-ray mask CANON KK (JP) 1997-03-19 EP disclosed
EP-0697630-A1 X-ray mask support CANON KABUSHIKI KAISHA (JP) 1996-02-21 EP disclosed
US-5101420-A X-RAY MASK SUPPORT AND PROCESS FOR PREPARATION THEREOF CANON KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed
EP-0310124-A2 Process for producing an X-ray mask CANON KABUSHIKI KAISHA (JP) 1989-04-05 EP disclosed