SCHEMBL7750894

SCHEMBL7750894

CCCCCCCCCCCCc1ccccc1CS(=O)(=O)[O-].c1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.43
CYSLTR2 Q9NS75 4/20 0.42
CYSLTR1 Q9Y271 4/20 0.42
BID P55957 3/20 0.40
MCL1 Q07820 3/20 0.40
BCL2L1 Q07817 2/20 0.40
BAK1 Q16611 2/20 0.40
KAT8 Q9H7Z6 2/20 0.40
PPARG P37231 1/20 0.40
PPARA Q07869 1/20 0.40
EP300 Q09472 1/20 0.40
KAT2A Q92830 1/20 0.40
KAT2B Q92831 1/20 0.40
KAT5 Q92993 1/20 0.40
SAE1 Q9UBE0 1/20 0.40
NR1H2 P55055 1/20 0.40
NR1H3 Q13133 1/20 0.40
KCNH2 Q12809 5/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4773210 0.88 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL194470 0.88 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL11790246 0.88 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL6322631 0.88 LIPG (0.50) LIPGCYSLTR2CYSLTR1BIDMCL1
Tetramethylammonium Ion SCHEMBL5605394 0.85 LIPG (0.47) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL218632 0.84 LIPG (0.45) LIPGCYSLTR2CYSLTR1BIDMCL1
Tetrabuthylammonium SCHEMBL5605702 0.82 LIPG (0.45) LIPGBIDMCL1BCL2L1BAK1
Tetrylammonium SCHEMBL5605834 0.82 LIPG (0.45) LIPGCYSLTR2CYSLTR1BIDMCL1
SCHEMBL1361329 0.82 LIPG (0.45) LIPGCYSLTR2CYSLTR1BIDMCL1
SCHEMBL452106 0.80 CES2 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0793144-B1 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5962180-A COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT JSR CORPORATION (JP) 1999-10-05 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed