SCHEMBL7751447

SCHEMBL7751447

CCC(O)OCCN(CC)CC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.40
MEN1 O00255 1/20 0.38
POLB P06746 1/20 0.38
KMT2A Q03164 1/20 0.38
CYP2D6 P10635 2/20 0.36
LMNA P02545 1/20 0.36
CYP1A2 P05177 1/20 0.36
ALDH1A1 P00352 1/20 0.35
CYP3A4 P08684 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
EBP Q15125 1/20 0.34
SIGMAR1 Q99720 1/20 0.34
KDM4E B2RXH2 2/20 0.34
CDYL Q9Y232 1/20 0.33
MAOA P21397 1/20 0.33
HTR3A P46098 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33
BLM P54132 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
ESR1 P03372 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21760359 0.87 CHRM2 (0.39) TSHRMEN1KMT2ACYP2D6LMNA
SCHEMBL7746583 0.79 TSHR (0.42) TSHRCYP2D6LMNACYP1A2CYP3A4
SCHEMBL749808 0.79 MEN1 (0.39) TSHRMEN1POLBKMT2ACYP2D6
SCHEMBL27482510 0.77 MEN1 (0.42) TSHRMEN1POLBKMT2ACYP2D6
SCHEMBL22166140 0.75 NAAA (0.39) TSHRCYP2D6LMNACYP1A2ALDH1A1
SCHEMBL12398415 0.74 MEN1 (0.39) TSHRMEN1POLBKMT2ACYP2D6
SCHEMBL5002480 0.73 MEN1 (0.41) TSHRMEN1POLBKMT2ACYP2D6
SCHEMBL14920988 0.73 MEN1 (0.41) TSHRMEN1POLBKMT2ACYP2D6
SCHEMBL28422042 0.73 MEN1 (0.38) TSHRMEN1POLBKMT2ACYP2D6
SCHEMBL7530091 0.72 MEN1 (0.34) TSHRMEN1POLBKMT2ACYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0675412-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5861232-A FLEXOGRAPHIC PLATE NIPPON PAINT CO., LTD. (JP) 1999-01-19 US disclosed
EP-0745900-B1 Water-developing photosensitive resin composition NIPPON PAINT CO LTD (JP) 1998-12-30 EP disclosed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US disclosed
US-5731129-A Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-03-24 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP disclosed
EP-0675412-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-04 EP disclosed
US-5354495-A Homo- or copolymerizable through ethylenic unsaturation NIPPON PAINT CO., LTD. (JP) 1994-10-11 US disclosed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP disclosed
EP-0204497-B1 Polymerisation process employing compounds having polymerisable acylurethane structures NIPPON PAINT CO LTD (JP) 1994-07-13 EP disclosed
EP-0177122-B1 ACRYLAMIDE DERIVATIVES Nippon Paint Co., Ltd. (JP) 1992-04-01 EP disclosed
US-4935413-A ELASTICITY, ADHESION AND DISPERSIBILITY NIPPON PAINT CO., LTD. (JP) 1990-06-19 US disclosed
US-4902727-A Compounds having a polymerizable acylurethane structure, and their production and process of using NIPPON PAINT CO., LTD. (JP) 1990-02-20 US disclosed
EP-0177122-A2 Acrylamide derivatives Nippon Paint Co., Ltd. (JP) 1986-04-09 EP disclosed