Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP8 | Q6V1X1 | 11/20 | 0.34 |
| ▸ | DPP9 | Q86TI2 | 11/20 | 0.34 |
| ▸ | GLMN | Q92990 | 1/20 | 0.33 |
| ▸ | DPP4 | P27487 | 5/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10169868 | 0.93 | DPP8 (0.32) | DPP8DPP9GLMNDPP4 | |
| SCHEMBL22503138 | 0.82 | THRB (0.32) | — | |
| SCHEMBL775943 | 0.81 | DPP4 (0.34) | DPP8DPP9GLMNDPP4 | |
| SCHEMBL4857036 | 0.80 | — | — | |
| SCHEMBL17266479 | 0.79 | DPP8 (0.32) | DPP8DPP9GLMNDPP4 | |
| SCHEMBL13445818 | 0.78 | DPP8 (0.32) | DPP8DPP9GLMNDPP4 | |
| SCHEMBL822780 | 0.78 | ALDH1A1 (0.36) | DPP8DPP9GLMN | |
| SCHEMBL4866288 | 0.78 | — | — | |
| SCHEMBL2734991 | 0.77 | DPP8 (0.40) | DPP8DPP9GLMNDPP4 | |
| SCHEMBL6560094 | 0.76 | TSHR (0.38) | DPP8DPP9GLMNDPP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9360754-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-07 | — | — | US | disclosed |
| US-9360754-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-07 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9063414-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9063414-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9029067-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9029067-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20110223544-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME | JSR CORPORATION (JP) | 2011-09-15 | — | — | US | disclosed |
| US-20110123936-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110111349-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20100323292-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100190104-A1 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20100040974-A1 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100021852-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-01-28 | — | — | US | disclosed |