SCHEMBL13445818

SCHEMBL13445818

C=CC(=O)OC12CC3CC(CC(NSOC(F)(F)F)(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
DPP8 Q6V1X1 8/20 0.32
DPP9 Q86TI2 8/20 0.32
GLMN Q92990 2/20 0.32
DPP4 P27487 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775839 0.78 DPP8 (0.34) DPP8DPP9GLMNDPP4
SCHEMBL10169868 0.76 DPP8 (0.32) DPP8DPP9GLMNDPP4
SCHEMBL822780 0.76 ALDH1A1 (0.36) DPP8DPP9GLMN
SCHEMBL6560094 0.75 TSHR (0.38) DPP8DPP9GLMNDPP4
SCHEMBL29281840 0.74 MEN1 (0.30)
SCHEMBL10169157 0.74 SCN9A (0.33)
SCHEMBL10169164 0.74 MEN1 (0.31)
SCHEMBL2610380 0.71
SCHEMBL4866288 0.71
SCHEMBL42912 0.70 PKM (0.38) DPP8DPP9DPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2010032839-A1 RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMATION METHOD JSR株式会社 (JP) 2010-03-25 WO disclosed