SCHEMBL775874

SCHEMBL775874

CCS(=O)(=O)Oc1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.63
CA2 P00918 5/20 0.54
CA1 P00915 3/20 0.54
CA9 Q16790 3/20 0.54
MMP2 P08253 2/20 0.46
MMP9 P14780 2/20 0.46
MMP14 P50281 2/20 0.46
MMP7 P09237 1/20 0.46
HTT P42858 2/20 0.44
PSIP1 O75475 1/20 0.44
LMNA P02545 2/20 0.44
PPARG P37231 1/20 0.44
NFE2L2 Q16236 1/20 0.44
CA12 O43570 1/20 0.44
MEN1 O00255 1/20 0.42
ENPP3 O14638 1/20 0.41
ENPP1 P22413 1/20 0.41
ENPP2 Q13822 1/20 0.41
LTA4H P09960 1/20 0.40
CA4 P22748 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9698692 0.98 KMT2A (0.61) KMT2ACA2CA1CA9MMP2
SCHEMBL30706304 0.98 KMT2A (0.61) KMT2ACA2CA1CA9MMP2
SCHEMBL576200 0.87 MMP2 (0.55) KMT2ACA2CA1CA9MMP2
SCHEMBL2058473 0.87 CA2 (0.60) KMT2ACA2CA1CA9MMP2
Glycine SCHEMBL27735227 0.87 KMT2A (0.50) KMT2ACA2CA1CA9MMP2
SCHEMBL27703494 0.85 KMT2A (0.57) KMT2ACA2CA1CA9MMP2
SCHEMBL249114 0.85 KMT2A (0.57) KMT2ACA2CA1CA9MMP2
SCHEMBL779566 0.83 KMT2A (0.72) KMT2ACA2CA1CA9MMP2
SCHEMBL10039237 0.83 KMT2A (0.65) KMT2ACA2CA1CA9HTT
SCHEMBL27333112 0.83 KMT2A (0.55) KMT2ACA2CA1CA9MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 308 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119978027-A Phosphine-nitrogen compound and metal complex, preparation method, composition and application thereof and carbonylation reaction method 中国石油化工股份有限公司 2025-05-13 CN claimed
CN-117062423-A Magnetic composite corrosion-resistant wave-absorbing material and application 攀枝花学院 2023-11-14 CN claimed
CN-116789523-A Process for preparing vicinal diols 中国石油化工股份有限公司 2023-09-22 CN claimed
CN-114214046-B High-temperature-resistant modified manganese dioxide nano plugging agent and oil-based drilling fluid 西南石油大学 2023-05-23 CN claimed
CN-115612573-A Formula and using method of adhesive remover for curing silicone adhesive 圣戈班汇杰(杭州)新材料有限公司 2023-01-17 CN claimed
CN-110819319-B Drilling fluid system and preparation method thereof 中国石油化工股份有限公司 2022-05-03 CN claimed
CN-110819316-B Drilling fluid treating agent and preparation method thereof 中国石油化工股份有限公司 2022-04-08 CN claimed
CN-113401967-A Method for removing p-toluenesulfonic acid anions in aqueous solution 北京理工大学 2021-09-17 CN claimed
CN-112218852-A Oxidized bis (3-indolyl) methane and uses thereof 桑福德·伯纳姆·普雷比医学发现研究所 2021-01-12 CN claimed
CN-106866971-B Weather-resistant low-temperature-resistant organic silicon impact modifier and preparation method and application thereof 广东优科艾迪高分子材料有限公司 2020-05-05 CN claimed
CN-102265446-A Nonaqueous electrolyte for lithium secondary battery and lithium secondary battery containing the same 2011-11-30 CN claimed
CN-101967106-A Method for treating L-p-hydroxyphenylglycine desalting mother liquor by adopting bipolar membrane electrodialysis technology HEBEI HONGYUAN CHEMICAL CO LTD 2011-02-09 CN claimed
US-6172133-B1 Caking additive composition for forming self-hardening mold KAO CORPORATION (JP) 2001-01-09 US claimed
EP-0908254-A1 CAKING ADDITIVE COMPOSITION FOR FORMING SELF-HARDENING MOLD Kao Corporation (JP) 1999-04-14 EP claimed
US-5648199-A SEMICONDUCTORS MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1997-07-15 US claimed
EP-0482098-B1 AQUEOUS DEVELOPER COMPOSITION FOR DEVELOPING NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 1995-12-06 EP claimed
EP-0482098-A1 AQUEOUS DEVELOPER COMPOSITION FOR DEVELOPING NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATES. EASTMAN KODAK CO (US) 1992-04-29 EP claimed
US-5035982-A Nontoxic vehicle, mixture of anionic surfactants, film former, desensitizer, acid EASTMAN KODAK COMPANY (US) 1991-07-30 US claimed
WO-1991001515-A1 AQUEOUS DEVELOPER COMPOSITION FOR DEVELOPING NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1991-02-07 WO claimed
US-4390475-A ADDING BENZENESULFONIC ACIDS PRIOR TO REACTION TO PREVENT ADHERENT DEPOSITS LION CORPORATION (JP) 1983-06-28 US claimed