SCHEMBL775941

SCHEMBL775941

C=C(C)C(=O)O/N=C(/C)c1c(F)cccc1F

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.46
POLB P06746 2/20 0.41
CES2 O00748 2/20 0.41
CES1 P23141 2/20 0.41
CYP1A2 P05177 2/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C19 P33261 1/20 0.36
CASP3 P42574 1/20 0.36
SENP8 Q96LD8 1/20 0.36
SENP7 Q9BQF6 1/20 0.36
SENP6 Q9GZR1 1/20 0.36
RAB9A P51151 3/20 0.36
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 2/20 0.33
ELANE P08246 1/20 0.33
ALDH1A1 P00352 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1697248 0.82 POLB (0.38) KMT2APOLBCES2CES1RAB9A
SCHEMBL12328544 0.75 MAPT (0.54) POLBCYP1A2CYP2D6CASP3SENP8
SCHEMBL775813 0.75 MAPT (0.54) POLBCYP1A2CYP2D6CASP3SENP8
SCHEMBL2625686 0.72 PKM (0.39) KMT2APOLBCES2CES1CYP1A2
SCHEMBL776029 0.70 ELANE (0.42) KMT2APOLBRAB9AELANEALDH1A1
SCHEMBL15836535 0.68 KMT2A (0.44) KMT2APOLBCES2CES1TDP1
SCHEMBL1697242 0.68 PPARG (0.47) KMT2ACES2CES1RAB9ATDP1
SCHEMBL27763941 0.67 CES2 (0.54) KMT2APOLBCES2CES1RAB9A
SCHEMBL6903312 0.67 ELANE (0.49) KMT2ATDP1LMNAELANEALDH1A1
SCHEMBL28094324 0.67 POLB (0.50) KMT2APOLBCES2CES1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed