SCHEMBL7764407

SCHEMBL7764407

O=C(c1ccc(OCc2ccccc2)cc1)C(F)(F)F

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A2 P43354 3/20 0.68
NR4A1 P22736 1/20 0.68
NR4A3 Q92570 1/20 0.68
MAOB P27338 1/20 0.64
PARP10 Q53GL7 1/20 0.64
SRD5A2 P31213 1/20 0.62
PLA2G4B P0C869 1/20 0.59
CES1 P23141 1/20 0.56
LMNA P02545 1/20 0.56
CYP1A2 P05177 1/20 0.56
PTGS1 P23219 1/20 0.56
SLC6A2 P23975 1/20 0.56
CYP2C19 P33261 1/20 0.56
PTGS2 P35354 1/20 0.56
SLC6A3 Q01959 1/20 0.56
HIF1A Q16665 1/20 0.56
HDAC6 Q9UBN7 1/20 0.56
MLYCD O95822 1/20 0.56
SMN1; SMN2 Q16637 3/20 0.55
NPC1 O15118 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32670446 0.84 SMN1; SMN2 (0.68) MAOBPARP10PLA2G4BHDAC6SMN1; SMN2
SCHEMBL15189660 0.84 MAOB (0.69) NR4A2NR4A1NR4A3MAOBPARP10
SCHEMBL18419287 0.83 PKM (0.66) PARP10CES1LMNAHDAC6MLYCD
SCHEMBL29890076 0.83 NR4A2 (0.70) NR4A2NR4A1NR4A3MAOBSRD5A2
SCHEMBL26933189 0.83 NR4A2 (0.70) NR4A2NR4A1NR4A3MAOBSRD5A2
SCHEMBL1115991 0.82 NR4A1 (0.60) NR4A2NR4A1NR4A3MAOBPARP10
SCHEMBL3232949 0.81 SRD5A2 (0.90) NR4A2NR4A1NR4A3MAOBPARP10
SCHEMBL6830467 0.81 NR4A2 (1.00) NR4A2NR4A1NR4A3MAOBPARP10
SCHEMBL4059143 0.81 NR4A2 (1.00) NR4A2NR4A1NR4A3MAOBPARP10
SCHEMBL228477 0.81 NR4A2 (1.00) NR4A2NR4A1NR4A3MAOBPARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 CN disclosed
EP-1100785-A1 SUBSTITUTED CYCLOHEXYLAMINOPYRIMIDINES Aventis CropScience GmbH (DE) 2001-05-23 EP disclosed
US-6197729-B1 COMBATING PEST WHICH COMPRISES APPLYING TO PEST OR ITS LOCUS PESTICIDAL CYCLOHEXYLAMINOPYRIMIDINNE COMPOUND HOECHST SCHERING AGREVO (DE) 2001-03-06 US disclosed
WO-2000007998-A1 SUBSTITUTED CYCLOHEXYLAMINOPYRIMIDINES AVENTIS CROPSCIENCE GMBH (DE) 2000-02-17 WO disclosed
US-5889012-A INSECTICIDE, ACARICIDES, FUNGICIDES HOECHST-SCHERING AGREVO GMBH (DE) 1999-03-30 US disclosed
EP-0787128-A1 SUBSTITUTED CYCLOALKYLAMINO AND CYCLOALKOXY HETEROCYCLES, PROCESS FOR PREPARING THE SAME AND THEIR USE AS PESTICIDES Hoechst Schering AgrEvo GmbH (DE) 1997-08-06 EP disclosed
EP-0434297-B1 Optically active aromatic compounds, preparation process thereof, and liquid crystal compositions and elements SUMITOMO CHEMICAL CO (JP) 1996-10-16 EP disclosed
WO-1996011913-A1 SUBSTITUTED CYCLOALKYLAMINO AND CYCLOALKOXY HETEROCYCLES, PROCESS FOR PREPARING THE SAME AND THEIR USE AS PESTICIDES HOECHST SCHERING AGREVO GMBH (DE) 1996-04-25 WO disclosed
US-5238598-A Having trifluoromethyl group; high speed response SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-08-24 US disclosed
EP-0434297-A2 Optically active aromatic compounds, preparation process thereof, and liquid crystal compositions and elements SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-06-26 EP disclosed