SCHEMBL7767149

SCHEMBL7767149

Cc1ccc(C(O)(c2ccccc2)C(O)(c2ccccc2)c2ccc(C)c(C)c2)cc1C

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 2/20 0.56
KIF11 P52732 3/20 0.46
ESR1 P03372 4/20 0.46
ESR2 Q92731 4/20 0.46
CES2 O00748 1/20 0.42
CES1 P23141 1/20 0.42
KMT2A Q03164 3/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
CYP3A4 P08684 3/20 0.39
ALDH1A1 P00352 2/20 0.39
MAPK1 P28482 1/20 0.38
FKBP5 Q13451 1/20 0.38
TSHR P16473 1/20 0.38
ACHE P22303 1/20 0.38
MEN1 O00255 2/20 0.37
MITF O75030 1/20 0.37
AR P10275 1/20 0.36
CYP2D6 P10635 1/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2867513 1.00 CYP19A1 (0.56) CYP19A1KIF11ESR1ESR2CES2
SCHEMBL2862802 0.79 MEN1 (0.50) CYP19A1KIF11ESR1ESR2CES2
SCHEMBL7768882 0.79 MEN1 (0.50) CYP19A1KIF11ESR1ESR2CES2
SCHEMBL2862818 0.78 KIF11 (0.47) KIF11CYP3A4MAPK1TSHRACHE
SCHEMBL7768253 0.78 KIF11 (0.47) KIF11CYP3A4MAPK1TSHRACHE
SCHEMBL7173455 0.78 CYP1A2 (0.48) ESR1ESR2KMT2ACYP3A4ALDH1A1
SCHEMBL36629 0.78 CYP1A2 (0.48) ESR1ESR2KMT2ACYP3A4ALDH1A1
SCHEMBL11587470 0.76 PTPN1 (0.50) KIF11CES2CES1CYP3A4ALDH1A1
SCHEMBL9453752 0.76 ESR1 (0.56) CYP19A1KIF11ESR1ESR2KMT2A
SCHEMBL29832060 0.75 CYP19A1 (0.49) CYP19A1KIF11ESR1ESR2CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0800116-B1 Photoresist composition MITSUBISHI CHEM CORP (JP) 2001-08-22 EP disclosed
US-5759736-A Photoresist composition MITSUBISHI CHEMICAL CORPORATION (JP) 1998-06-02 US disclosed
EP-0800116-A1 Photoresist composition Mitsubishi Chemical Corporation (JP) 1997-10-08 EP disclosed