SCHEMBL7768253

SCHEMBL7768253

Cc1cccc(C(O)(c2ccccc2)C(O)(c2ccccc2)c2cccc(C)c2)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 5/20 0.47
CYP3A4 P08684 2/20 0.47
CYP2D6 P10635 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
KCNH2 Q12809 1/20 0.47
ACHE P22303 3/20 0.46
CNR1 P21554 2/20 0.45
CNR2 P34972 2/20 0.45
LMNA P02545 2/20 0.44
PTPN5 P54829 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
TSHR P16473 1/20 0.42
ALOX12 P18054 1/20 0.42
POLB P06746 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.40
HTR3E A5X5Y0 1/20 0.39
HTR3B O95264 1/20 0.39
HTR3A P46098 1/20 0.39
HTR3D Q70Z44 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2862818 1.00 KIF11 (0.47) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL812716 0.83 CYP19A1 (0.51) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL17506577 0.83 CYP19A1 (0.51) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL18634238 0.81 CNR1 (0.47) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL8784973 0.79 ACHE (0.52) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL2862802 0.79 MEN1 (0.50) KIF11CYP3A4ACHELMNANPSR1
SCHEMBL7768882 0.79 MEN1 (0.50) KIF11CYP3A4ACHELMNANPSR1
SCHEMBL3677112 0.79 ACHE (0.52) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL31589254 0.79 ACHE (0.52) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL7767149 0.78 CYP19A1 (0.56) KIF11CYP3A4CYP2D6ACHELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0800116-B1 Photoresist composition MITSUBISHI CHEM CORP (JP) 2001-08-22 EP disclosed
US-5759736-A Photoresist composition MITSUBISHI CHEMICAL CORPORATION (JP) 1998-06-02 US disclosed
EP-0800116-A1 Photoresist composition Mitsubishi Chemical Corporation (JP) 1997-10-08 EP disclosed