Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL973803 | 0.94 | APP (0.37) | CES2APP | |
| SCHEMBL14894 | 0.86 | PTGS1 (0.37) | APP | |
| Ammonia Solution, Strong SCHEMBL1302015 | 0.84 | PTGS1 (0.36) | — | |
| SCHEMBL871697 | 0.81 | CES2 (0.44) | CES2 | |
| SCHEMBL5162456 | 0.80 | BBOX1 (0.35) | — | |
| SCHEMBL37545 | 0.79 | APP (0.48) | APP | |
| Water SCHEMBL5161722 | 0.79 | BBOX1 (0.34) | — | |
| Water SCHEMBL22773556 | 0.79 | BBOX1 (0.34) | — | |
| SCHEMBL9828311 | 0.77 | KDM4E (0.58) | CES2 | |
| SCHEMBL6259281 | 0.77 | CES2 (0.33) | CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1111456-A1 | Method for forming an improved imaging support element including amine reactive side groups and element formed therewith | EASTMAN KODAK COMPANY (US) | 2001-06-27 | — | — | EP | claimed |
| US-6190842-B1 | Method for forming an improved imaging support element including amine reactive side groups and element formed therewith | EASTMAN KODAK COMPANY | 2001-02-20 | — | — | US | claimed |
| EP-3079015-B1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | SHINETSU CHEMICAL CO (JP) | 2020-04-29 | — | — | EP | disclosed |
| US-9904169-B2 | Photomask blank, resist pattern forming process, and method for making photomask | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-3040776-B1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | SHINETSU CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | disclosed |
| US-20160299431-A1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-13 | — | — | US | disclosed |
| EP-3079015-A1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-10-12 | — | — | EP | disclosed |
| EP-3040776-A1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-07-06 | — | — | EP | disclosed |
| US-20160147142-A1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-26 | — | — | US | disclosed |
| EP-1111456-A1 | Method for forming an improved imaging support element including amine reactive side groups and element formed therewith | EASTMAN KODAK COMPANY (US) | 2001-06-27 | — | — | EP | disclosed |
| EP-1111455-A1 | Method for forming an improved imaging support element and element formed therewith | EASTMAN KODAK COMPANY (US) | 2001-06-27 | — | — | EP | disclosed |
| US-6235459-B1 | FORMING LAYER OVER POLYMERIC SUPPORT; HETA TREATMENT | EASTMAN KODAK COMPANY | 2001-05-22 | — | — | US | disclosed |
| US-6190842-B1 | Method for forming an improved imaging support element including amine reactive side groups and element formed therewith | EASTMAN KODAK COMPANY | 2001-02-20 | — | — | US | disclosed |