Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | TSHR | P16473 | 6/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.42 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TGM2 | P21980 | 3/20 | 0.35 |
| ▸ | FAAH | O00519 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16805860 | 0.82 | TSHR (0.54) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL13275928 | 0.82 | TSHR (0.45) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL5576280 | 0.82 | TSHR (0.45) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL17522059 | 0.80 | TSHR (0.52) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL11234876 | 0.80 | TSHR (0.52) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL7768846 | 0.79 | TSHR (0.52) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL4455953 | 0.79 | ZDHHC20 (0.48) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL29060324 | 0.78 | TSHR (0.50) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL28330305 | 0.78 | TSHR (0.50) | ALDH1A1TSHRMAPK1TDP1ZDHHC20 | |
| SCHEMBL138455 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119119543-A | Thin glitter powder and preparation method thereof | 东莞光群雷射科技有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-112300023-A | Acrylamide monomer and preparation method and application thereof | 中国石油化工股份有限公司 | 2021-02-02 | — | — | CN | claimed |
| CN-119119543-A | Thin glitter powder and preparation method thereof | 东莞光群雷射科技有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-117964824-B | Multiple stimulus responsive homopolymer and preparation method and application thereof | 天津师范大学 | 2024-05-28 | — | — | CN | disclosed |
| CN-116041869-B | Low-dielectric polyphenyl ether modified polystyrene material and preparation method thereof | 大连理工大学 | 2024-05-17 | — | — | CN | disclosed |
| CN-117964824-A | Multiple stimulus responsive homopolymer and preparation method and application thereof | 天津师范大学 | 2024-05-03 | — | — | CN | disclosed |
| CN-112300023-B | Acrylamide monomer, and preparation method and application thereof | 中国石油化工股份有限公司 | 2023-06-16 | — | — | CN | disclosed |
| CN-116041869-A | Low-dielectric polyphenyl ether modified polystyrene material and preparation method thereof | 大连理工大学 | 2023-05-02 | — | — | CN | disclosed |
| CN-112300023-A | Acrylamide monomer and preparation method and application thereof | 中国石油化工股份有限公司 | 2021-02-02 | — | — | CN | disclosed |
| US-9671691-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-20160075806-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| CN-1103698-C | Lithographic form plate | TORAY INDUSTRIES (JP) | 2003-03-26 | — | — | CN | disclosed |
| EP-0755803-B1 | LITHOGRAPHIC FORM PLATE | TORAY INDUSTRIES (JP) | 2001-07-25 | — | — | EP | disclosed |
| US-6093509-A | NON-IMAGE AREA COMPRISE A HYDROPHILIC SWELLABLE LAYER WITH SPEACIFIC WATER ABSORBABILITY, MODULUS AND WATER SWELLING RATIO | TORAY INDUSTRIES, INC. (JP) | 2000-07-25 | — | — | US | disclosed |
| CN-1152278-A | Lithographic form plate | TORAY INDUSTRIES (JP) | 1997-06-18 | — | — | CN | disclosed |
| EP-0755803-A1 | LITHOGRAPHIC FORM PLATE | TORAY INDUSTRIES, INC. (JP) | 1997-01-29 | — | — | EP | disclosed |
| US-4256827-A | ADDITION TERPOLYMER LATEX | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-17 | — | — | US | disclosed |
| US-4191838-A | Acryloxy-alkylpropanals and methacryloxy-alkylpropanals | BASF AKTIENGESELLSCHAFT (DE) | 1980-03-04 | — | — | US | disclosed |
| US-4145500-A | Stabilization of crosslinkable polymers | BAYER AKTIENGESELLSCHAFT (DE) | 1979-03-20 | — | — | US | disclosed |