Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | ELANE | P08246 | 2/20 | 0.36 |
| ▸ | CTSG | P08311 | 1/20 | 0.36 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.36 |
| ▸ | BACE1 | P56817 | 2/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7789538 | 0.76 | GAA (0.47) | GAAL3MBTL1ATMELANECTSG | |
| SCHEMBL8749219 | 0.73 | ELANE (0.34) | L3MBTL1ELANECTSGPRTN3ALDH1A1 | |
| SCHEMBL8749165 | 0.72 | PTPN1 (0.41) | — | |
| SCHEMBL10585697 | 0.72 | GAA (0.35) | GAAL3MBTL1ATMBACE1ALDH1A1 | |
| SCHEMBL10926238 | 0.71 | SIRT1 (0.46) | ATMHSD11B1TSHRALDH1A1 | |
| SCHEMBL11253677 | 0.71 | PTPN1 (0.42) | GAAALDH1A1 | |
| SCHEMBL14130984 | 0.67 | GAA (0.41) | GAAL3MBTL1ATMBACE1ALDH1A1 | |
| SCHEMBL22015030 | 0.67 | GAA (0.48) | GAAL3MBTL1ATMELANECTSG | |
| SCHEMBL9876467 | 0.67 | GAA (0.55) | GAAL3MBTL1ATMELANECTSG | |
| SCHEMBL15031149 | 0.66 | GAA (0.38) | GAAL3MBTL1HSD11B1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0799716-B1 | Diazo compounds for laser-induced mass transfer imaging materials | MINNESOTA MINING & MFG (US) | 2001-11-07 | — | — | EP | disclosed |
| US-5756689-A | SENSITIZERS; COMPOUNDS STABILIZED BY CERTAIN FUNCTIONAL GROUPS ADJACENT TO THE DIAZO SUBSTITUENT | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-05-26 | — | — | US | disclosed |
| US-5691098-A | WITH STABILIZING ELECTRON WITHDRAWING GROUP | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-11-25 | — | — | US | disclosed |
| EP-0799716-A2 | Diazo compounds for laser-induced mass transfer imaging materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-10-08 | — | — | EP | disclosed |
| US-5627006-A | ALKENYLOXY-SUBSTITUTED POLYVINYLPHENOLS, PHOTOSENSITIVE ACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-05-06 | — | — | US | disclosed |
| EP-0552548-B1 | Resist material | WAKO PURE CHEM IND LTD (JP) | 1997-03-19 | — | — | EP | disclosed |
| EP-0323050-B1 | Photosensitive compound | WAKO PURE CHEM IND LTD (JP) | 1994-11-02 | — | — | EP | disclosed |
| US-5250669-A | Thermostability, photoresists | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0552548-A1 | Resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1993-07-28 | — | — | EP | disclosed |
| EP-0323050-A2 | Photosensitive compound | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1989-07-05 | — | — | EP | disclosed |
| EP-0319325-A2 | Photosensitive material and process for forming pattern using the same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1989-06-07 | — | — | EP | disclosed |