SCHEMBL7789538

SCHEMBL7789538

CC1(CCc2ccccc2)OC(=O)CC(=O)O1

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
BACE1 P56817 2/20 0.40
ALDH1A1 P00352 1/20 0.39
ATM Q13315 1/20 0.38
ELANE P08246 1/20 0.38
CTSG P08311 1/20 0.38
PRTN3 P24158 1/20 0.38
MEN1 O00255 1/20 0.38
USP2 O75604 1/20 0.38
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38
KMT2A Q03164 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TSHR P16473 1/20 0.38
KEAP1 Q14145 1/20 0.37
SIGMAR1 Q99720 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16654354 0.83 ALDH1A1 (0.40) ALDH1A1MAPT
SCHEMBL15648040 0.83 TAAR1 (0.37) ALDH1A1
SCHEMBL18805033 0.82 ELANE (0.42) GAAL3MBTL1BACE1ALDH1A1ELANE
SCHEMBL22015030 0.77 GAA (0.48) GAAL3MBTL1BACE1ALDH1A1ATM
SCHEMBL23051143 0.76 FKBP1A (0.31)
SCHEMBL7781925 0.76 GAA (0.43) GAAL3MBTL1BACE1ALDH1A1ATM
SCHEMBL14130984 0.74 GAA (0.41) GAAL3MBTL1BACE1ALDH1A1ATM
SCHEMBL31274392 0.71 MAPK1 (0.41) GAAL3MBTL1BACE1ALDH1A1ATM
SCHEMBL5708886 0.71 PTPN1 (0.33) ALDH1A1MEN1MAPTKMT2A
SCHEMBL6953976 0.71 GAA (0.37) GAAL3MBTL1BACE1ALDH1A1CTSG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0799716-B1 Diazo compounds for laser-induced mass transfer imaging materials MINNESOTA MINING & MFG (US) 2001-11-07 EP disclosed
US-5756689-A SENSITIZERS; COMPOUNDS STABILIZED BY CERTAIN FUNCTIONAL GROUPS ADJACENT TO THE DIAZO SUBSTITUENT MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-05-26 US disclosed
US-5691098-A WITH STABILIZING ELECTRON WITHDRAWING GROUP MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-11-25 US disclosed
EP-0799716-A2 Diazo compounds for laser-induced mass transfer imaging materials MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-10-08 EP disclosed
US-5627006-A ALKENYLOXY-SUBSTITUTED POLYVINYLPHENOLS, PHOTOSENSITIVE ACID GENERATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-05-06 US disclosed
EP-0552548-B1 Resist material WAKO PURE CHEM IND LTD (JP) 1997-03-19 EP disclosed
EP-0323050-B1 Photosensitive compound WAKO PURE CHEM IND LTD (JP) 1994-11-02 EP disclosed
US-5250669-A Thermostability, photoresists WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-05 US disclosed
EP-0552548-A1 Resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1993-07-28 EP disclosed
EP-0323050-A2 Photosensitive compound WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1989-07-05 EP disclosed
EP-0319325-A2 Photosensitive material and process for forming pattern using the same WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1989-06-07 EP disclosed