SCHEMBL7782799

SCHEMBL7782799

[S]c1ccccc1Nc1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.56
TDP1 Q9NUW8 6/20 0.56
GAA P10253 5/20 0.56
MEN1 O00255 4/20 0.56
KMT2A Q03164 4/20 0.56
KDM4E B2RXH2 4/20 0.56
GLA P06280 2/20 0.56
RECQL P46063 1/20 0.56
ALDH1A1 P00352 8/20 0.54
CYP1A2 P05177 2/20 0.54
CYP2C9 P11712 2/20 0.54
CYP2C19 P33261 2/20 0.54
LMNA P02545 2/20 0.54
CYP2D6 P10635 1/20 0.54
HSD17B10 Q99714 4/20 0.52
ALOX15 P16050 5/20 0.50
HPGD P15428 4/20 0.50
L3MBTL1 Q9Y468 3/20 0.50
MAPK1 P28482 3/20 0.50
CYP3A4 P08684 3/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL444976 0.81 MAPT (0.70) MAPTTDP1GAAMEN1KMT2A
SCHEMBL304152 0.75 MAPT (0.56) MAPTTDP1GAAMEN1KMT2A
SCHEMBL13363917 0.74 MAPT (0.61) MAPTTDP1GAAMEN1KMT2A
SCHEMBL5080930 0.73 HSD17B10 (0.65) MAPTTDP1GAAMEN1KMT2A
SCHEMBL29871430 0.72 MAPT (0.58) MAPTTDP1GAAMEN1KMT2A
SCHEMBL6404861 0.72 MEN1 (1.00) MAPTTDP1GAAMEN1KMT2A
SCHEMBL28969955 0.72 MAPT (0.65) MAPTTDP1GAAMEN1KMT2A
SCHEMBL5697158 0.71 HPGD (0.60) MAPTTDP1GAAMEN1KMT2A
SCHEMBL12320135 0.71 MAPT (0.52) MAPTTDP1GAAMEN1KMT2A
Diphenylamine SCHEMBL3003404 0.71 HSD17B10 (1.00) MAPTTDP1GAAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2700644-B1 NOVEL COMPOUND, NEAR-INFRARED ABSORBENT, AND SYNTHETIC RESIN COMPOSITION CONTAINING SAME ADEKA CORP (JP) 2015-05-20 EP disclosed
EP-2700644-A1 NOVEL COMPOUND, NEAR-INFRARED ABSORBENT, AND SYNTHETIC RESIN COMPOSITION CONTAINING SAME Adeka Corporation (JP) 2014-02-26 EP disclosed
US-8652363-B1 Compound, near-infrared absorber, and synthetic resin composition containing same ADEKA CORPORATION (JP) 2014-02-18 US disclosed
US-20140027685-A1 NOVEL COMPOUND, NEAR-INFRARED ABSORBER, AND SYNTHETIC RESIN COMPOSITION CONTAINING SAME ADEKA CORPORATION (JP) 2014-01-30 US disclosed
EP-1152035-A1 PREFORM FOR HOLLOW MOLDING MADE OF POLYESTER RESIN COMPOSITION, HOLLOW MOLDING MADE OF POLYESTER RESIN COMPOSITION, AND PROCESS FOR PRODUCING THE SAME Mitsui Chemicals, Inc. (JP) 2001-11-07 EP disclosed
EP-0767221-B1 Near infrared ray absorbing compound having high durability and its use MITSUI CHEMICALS INC (JP) 2000-07-05 EP disclosed
EP-0718375-B1 Near infrared absorber, preparation process thereof and use thereof MITSUI CHEMICALS INC (JP) 2000-07-05 EP disclosed
US-5788914-A Near infrared ray absorbing compound having high durability and its use MITSUI CHEMICALS, INC. (JP) 1998-08-04 US disclosed
EP-0732049-B1 Covering material for plant growth control MITSUI TOATSU CHEMICALS (JP) 1998-05-06 EP disclosed
US-5705101-A PHTHALOCYANINE DERIVATIVES MITSUI TOATSU CHEMICALS, INC. (JP) 1998-01-06 US disclosed
EP-0767221-A1 Near infrared ray absorbing compound having high durability and its use MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-04-09 EP disclosed
EP-0732049-A1 Covering material for plant growth control MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1996-09-18 EP disclosed
EP-0718375-A2 Near infrared absorber, preparation process thereof and use thereof MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1996-06-26 EP disclosed
US-3980677-A Anthraquinone dyestuffs containing sulphonic acid groups BAYER AKTIENGESELLSCHAFT (DT) 1976-09-14 US disclosed