SCHEMBL778999

SCHEMBL778999

O=S(=O)(c1cccc(OCCO)c1)c1ccccc1OCCO

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.45
RECQL P46063 2/20 0.45
F2 P00734 3/20 0.43
HTR6 P50406 2/20 0.42
MMP2 P08253 2/20 0.39
MMP1 P03956 1/20 0.39
MMP3 P08254 1/20 0.39
MMP9 P14780 1/20 0.39
MMP12 P39900 1/20 0.39
MMP13 P45452 1/20 0.39
MMP14 P50281 1/20 0.39
GAA P10253 2/20 0.38
FABP1 P07148 1/20 0.37
MAPT P10636 2/20 0.37
LMNA P02545 1/20 0.37
KAT6A Q92794 2/20 0.37
KCNA3 P22001 1/20 0.36
MEN1 O00255 1/20 0.36
MAPK1 P28482 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2315856 0.85 ALDH1A1 (0.52) ALDH1A1RECQLF2HTR6GAA
SCHEMBL4354588 0.84 MMP2 (0.53) ALDH1A1RECQLHTR6MMP2MMP1
SCHEMBL6874469 0.82 ALDH1A1 (0.45) ALDH1A1RECQLHTR6GAAMAPT
SCHEMBL31687979 0.82 ALDH1A1 (0.45) ALDH1A1RECQLHTR6GAAMAPT
SCHEMBL34117 0.82 ALDH1A1 (0.45) ALDH1A1RECQLHTR6GAAMAPT
SCHEMBL5414167 0.77 HTR6 (0.47) ALDH1A1RECQLHTR6MMP2MMP1
SCHEMBL8702941 0.74 ALDH1A1 (0.44) ALDH1A1RECQLGAAMAPTLMNA
SCHEMBL19277425 0.72 CASR (0.45) ALDH1A1RECQLGAA
SCHEMBL10757156 0.72 IDO1 (0.46) ALDH1A1RECQLGAAMAPTLMNA
SCHEMBL28622104 0.72 ALDH1A1 (0.45) ALDH1A1RECQLF2HTR6MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240228769-A1 METHOD FOR PRODUCING POLYESTER RESIN COMPOSITION AND METHOD FOR REGENERATING COLLECTED POLYESTER RESIN TOYOBO CO., LTD. (JP) 2024-07-11 US disclosed
EP-4130095-B1 POLYESTER RESIN AND METHOD FOR PRODUCING BLOW MOLDED BODY FORMED OF POLYESTER RESIN TOYO BOSEKI (JP) 2024-07-03 EP disclosed
EP-4361218-A1 POLYESTER RESIN COMPOSITION PRODUCTION METHOD, METHOD FOR REGENERATING RECOVERED POLYESTER RESIN, AND POLYESTER RESIN COMPOSITION TOYOBO CO., LTD. (JP) 2024-05-01 EP disclosed
EP-4335903-A1 METHOD FOR PRODUCING POLYESTER RESIN COMPOSITION AND METHOD FOR REGENERATING COLLECTED POLYESTER RESIN TOYOBO CO., LTD. (JP) 2024-03-13 EP disclosed
EP-3733734-B1 POLY(ESTER)CARBONATE AND METHOD FOR PRODUCING POLY(ESTER)CARBONATE TEIJIN LTD (JP) 2024-03-06 EP disclosed
WO-2024038815-A1 PRODUCTION METHOD FOR POLYESTER RESIN COMPOSITION, REGENERATION METHOD FOR RECOVERED POLYESTER RESIN, AND POLYESTER RESIN COMPOSITION 東洋紡株式会社 2024-02-22 WO disclosed
WO-2024038867-A1 METHOD FOR PRODUCING POLYESTER FILM USING RECYCLED POLYESTER RESIN, AND POLYESTER FILM 東洋紡株式会社 2024-02-22 WO disclosed
WO-2023243609-A1 COPOLYMERIZED POLYESTER RESIN AND MOLDED ARTICLE OF SAME, AND COPOLYMERIZED POLYESTER RESIN PRODUCTION METHOD 東洋紡株式会社 2023-12-21 WO disclosed
WO-2023233984-A1 RESIN COMPOSITION 三菱瓦斯化学株式会社 2023-12-07 WO disclosed
US-20230365747-A1 A POLYESTER RESIN, A HOLLOW MOLDED BODY FORMED THEREFROM, AND A PRODUCTION METHOD THEREFOR TOYOBO CO., LTD. (JP) 2023-11-16 US disclosed
EP-1719790-A1 POLYESTER POLYMERIZATION CATALYST, POLYESTER PRODUCED THEREWITH AND PROCESS FOR PRODUCING THE POLYESTER Toyo Boseki Kabushiki Kaisha (JP) 2006-11-08 EP disclosed
EP-1693403-A1 THERMOPLASTIC RESIN COMPOSITION FOR MASTERBATCH, PROCESS FOR PRODUCING MOLDING MATERIAL COMPRISING THE SAME, THERMOPLASTIC RESIN COMPOSITION OBTAINED WITH THE SAME, AND PROCESS FOR PRODUCING THE COMPOSITION Toyo Boseki Kabushiki Kaisha (JP) 2006-08-23 EP disclosed
US-20060148393-A1 Polishing pad and cushion layer for polishing pad ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2006-07-06 US disclosed
US-20060148392-A1 Method of producing polishing pad ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2006-07-06 US disclosed
US-20060148391-A1 Polishing pad and cushion layer for polishing pad ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2006-07-06 US disclosed
EP-1227117-B1 POLYMERIZATION CATALYSTS FOR POLYESTERS, POLYESTERS PRODUCED WITH THE SAME AND PROCESS FOR PRODUCTION OF POLYESTERS TOYO BOSEKI (JP) 2004-12-01 EP disclosed
EP-1227117-A1 POLYMERIZATION CATALYSTS FOR POLYESTERS, POLYESTERS PRODUCED WITH THE SAME AND PROCESS FOR PRODUCTION OF POLYESTERS Toyo Boseki Kabushiki Kaisha (JP) 2002-07-31 EP disclosed
EP-1188848-A1 FLAME-RETARDANT POLYESTER FIBER, WOVEN OR KNITTED FLAME-RETARDANT POLYESTER FIBER FABRIC, NONWOVEN FLAME-RETARDANT POLYESTER FIBER FABRIC, AND WOVEN OR KNITTED SUEDE FABRIC Toyo Boseki Kabushiki Kaisha (JP) 2002-03-20 EP disclosed
EP-1153953-A1 POLYMERIZATION CATALYST FOR POLYESTER PRODUCTION, POLYESTER, AND PROCESS FOR PRODUCING POLYESTER Toyo Boseki Kabushiki Kaisha (JP) 2001-11-14 EP disclosed
EP-0394751-A2 Cocondensation polyester, process for manufacturing same and uses thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-10-31 EP disclosed