SCHEMBL7790364

SCHEMBL7790364

C[CH]OC(=O)NCCCC

nearest known ligand 0.59

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ACHE P22303 14/20 0.59
EPHX1 P07099 3/20 0.53
BCHE P06276 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11780042 0.92 EPHX1 (0.66) ACHEEPHX1
SCHEMBL5077587 0.92 EPHX1 (0.66) ACHEEPHX1
SCHEMBL514362 0.87
SCHEMBL1416150 0.83 TDP1 (0.47) ACHEEPHX1
SCHEMBL20162221 0.83 ACHE (0.59) ACHEEPHX1BCHE
SCHEMBL3916781 0.82 ACHE (0.57) ACHEEPHX1BCHE
SCHEMBL28396215 0.82 ACHE (0.57) ACHEEPHX1BCHE
SCHEMBL10935539 0.80 ACHE (0.55) ACHEEPHX1
SCHEMBL1416053 0.78
SCHEMBL1416366 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0832082-B1 N-HETEROARYL-PYRIDINESULFONAMIDE DERIVATIVES AND THEIR USE AS ENDOTHELIN ANTAGONISTS ASTRAZENECA AB (SE) 2001-11-21 EP claimed
US-4560751-A CYCLIZATION OF AMIDO-THIOAMIDE COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1985-12-24 US claimed
US-4250090-A COLORFASTNESS; WETFASTNESS; ACID AZO DYES BASF AKTIENGESELLSCHAFT (DE) 1981-02-10 US claimed
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
US-20230348742-A1 Radiation Curable Ink Jet Composition SEIKO EPSON CORPORATION (JP) 2023-11-02 US disclosed
EP-4269511-A1 RADIATION CURABLE INK JET COMPOSITION Seiko Epson Corporation (JP) 2023-11-01 EP disclosed
US-20230330805-A1 POROUS CHEMICAL MECHANICAL POLISHING PADS APPLIED MATERIALS, INC. (US) 2023-10-19 US disclosed
US-11685014-B2 Formulations for advanced polishing pads APPLIED MATERIALS, INC. (US) 2023-06-27 US disclosed
US-20230174809-A1 Radiation-Curable Ink Jet Composition And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2023-06-08 US disclosed
US-11485904-B2 Layered structures, production methods thereof, and liquid crystal display including the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2022-11-01 US disclosed
EP-0100018-B1 PROCESS FOR THE PRODUCTION OF 2-N,N-DISUBSTITUTED AMINOTHIAZOLES BASF Aktiengesellschaft (DE) 1986-04-02 EP disclosed
US-4560751-A CYCLIZATION OF AMIDO-THIOAMIDE COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1985-12-24 US disclosed
EP-0051818-B1 PROCESS FOR THE PRODUCTION OF DISCHARGE-RESIST PRINTS ON TEXTILE MATERIALS CASSELLA Aktiengesellschaft (DE) 1985-09-04 EP disclosed
EP-0100018-A1 Process for the production of 2-N,N-disubstituted aminothiazoles BASF Aktiengesellschaft (DE) 1984-02-08 EP disclosed
US-4398913-A ALKALINE PASTES CASSELLA AKTIENGESELLSCHAFT (DE) 1983-08-16 US disclosed
US-4386935-A Process for producing discharge reserve prints on textile materials with amino-azo-benzene dyes CASSELLA AKTIENGESELLSCHAFT (DE) 1983-06-07 US disclosed
EP-0051818-A1 Process for the production of discharge-resist prints on textile materials CASSELLA Aktiengesellschaft (DE) 1982-05-19 EP disclosed
US-4250090-A COLORFASTNESS; WETFASTNESS; ACID AZO DYES BASF AKTIENGESELLSCHAFT (DE) 1981-02-10 US disclosed
US-4014864-A POLYESTER FIBERS CIBA-GEIGY CORPORATION (US) 1977-03-29 US disclosed