SCHEMBL514362

SCHEMBL514362

C[CH]OC(=O)NCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7790364 0.87 ACHE (0.59)
SCHEMBL11780042 0.84 EPHX1 (0.66)
SCHEMBL5077587 0.84 EPHX1 (0.66)
SCHEMBL1416053 0.82
SCHEMBL1416366 0.81
SCHEMBL3686778 0.80
SCHEMBL1415870 0.80 EPHX1 (0.45)
SCHEMBL28291646 0.79 BCHE (0.38)
SCHEMBL1415842 0.79 EPHX2 (0.41)
SCHEMBL1416139 0.78 HPGD (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0832082-B1 N-HETEROARYL-PYRIDINESULFONAMIDE DERIVATIVES AND THEIR USE AS ENDOTHELIN ANTAGONISTS ASTRAZENECA AB (SE) 2001-11-21 EP claimed
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
WO-2023210623-A1 HALOALKYL SULFONE ANILIDE COMPOUND AND HERBICIDE CONTAINING SAME 株式会社エス・ディー・エス バイオテック 2023-11-02 WO disclosed
US-20230348742-A1 Radiation Curable Ink Jet Composition SEIKO EPSON CORPORATION (JP) 2023-11-02 US disclosed
EP-4269511-A1 RADIATION CURABLE INK JET COMPOSITION Seiko Epson Corporation (JP) 2023-11-01 EP disclosed
US-20230174809-A1 Radiation-Curable Ink Jet Composition And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2023-06-08 US disclosed
US-20210301158-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20200131381-A1 RADIATION CURABLE INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2020-04-30 US disclosed
WO-2014184071-A1 MIXTURES OF HALOALKYLSULFONANILIDE DERIVATIVES AND HERBICIDES SYNGENTA LIMITED (GB) 2014-11-20 WO disclosed
EP-2336104-A1 ORTHO-SUBSTITUTED HALOALKYLSULFONANILIDE DERIVATIVE AND HERBICIDE Nissan Chemical Industries, Ltd. (JP) 2011-06-22 EP disclosed
EP-2165830-B1 Lithographic printing plate precursor and printing method using the same FUJIFILM CORP (JP) 2011-03-16 EP disclosed
US-20100071574-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-03-25 US disclosed
EP-2165830-A1 Lithographic printing plate precursor and printing method using the same Fujifilm Corporation (JP) 2010-03-24 EP disclosed
EP-0832082-B1 N-HETEROARYL-PYRIDINESULFONAMIDE DERIVATIVES AND THEIR USE AS ENDOTHELIN ANTAGONISTS ASTRAZENECA AB (SE) 2001-11-21 EP disclosed
US-6258817-B1 PRODRUGS, HYPOTENSIVE AGENTS AND CARDIOVASCULAR DISORDERS ZENECA LTD. (GB) 2001-07-10 US disclosed
EP-0378167-B1 Disperse dye composition useful for dyeing or printing hydrophobic fiber materials SUMITOMO CHEMICAL CO (JP) 1994-12-28 EP disclosed
US-5038415-A Bath stability; level dyeing SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-08-13 US disclosed
EP-0378167-A1 Disperse dye composition useful for dyeing or printing hydrophobic fiber materials SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-07-18 EP disclosed
US-4398913-A ALKALINE PASTES CASSELLA AKTIENGESELLSCHAFT (DE) 1983-08-16 US disclosed