SCHEMBL7790404

SCHEMBL7790404

Cc1ccc(S(=O)(=O)OCc2ccccc2)c([N+](=O)[O-])c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
CYP3A4 P08684 2/20 0.48
MAPK1 P28482 2/20 0.48
CYP1A2 P05177 1/20 0.48
CYP2D6 P10635 1/20 0.48
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
HIF1A Q16665 1/20 0.48
TSHR P16473 2/20 0.45
MCOLN3 Q8TDD5 1/20 0.44
NPC1 O15118 4/20 0.44
RAB9A P51151 4/20 0.44
CYP19A1 P11511 1/20 0.43
MEN1 O00255 4/20 0.42
KMT2A Q03164 4/20 0.42
AR P10275 1/20 0.42
NFKBIA P25963 1/20 0.41
AGTR1 P30556 1/20 0.41
OPRK1 P41145 1/20 0.41
RELA Q04206 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6513510 0.85 CA1 (0.41) ALDH1A1CYP3A4MAPK1CYP1A2CYP2D6
SCHEMBL9550120 0.84 ALDH1A1 (0.47) ALDH1A1CYP3A4TSHRMCOLN3NPC1
SCHEMBL2431717 0.84 ALDH1A1 (0.45) ALDH1A1CYP3A4MAPK1CYP1A2CYP2D6
SCHEMBL9550123 0.83 CYP19A1 (0.45) ALDH1A1CYP3A4MAPK1CYP1A2CYP2D6
SCHEMBL27966350 0.82 MAPT (0.48) ALDH1A1CYP3A4CYP1A2NPC1RAB9A
SCHEMBL9550111 0.81 ACHE (0.43) ALDH1A1CYP3A4TSHRMCOLN3NPC1
SCHEMBL17263332 0.81 ALDH1A1 (0.72) ALDH1A1CYP3A4MAPK1CYP1A2CYP2D6
SCHEMBL28845039 0.80 KMT2A (0.49) ALDH1A1CYP3A4CYP1A2CYP2C19TSHR
SCHEMBL217303 0.80 POLB (0.49) ALDH1A1CYP3A4MAPK1CYP1A2CYP2D6
SCHEMBL9550108 0.78 CYP19A1 (0.45) ALDH1A1CYP3A4MAPK1CYP1A2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114127202-B Composition for coating high-low-level substrates comprising compound having curable functional group 日产化学株式会社 2023-09-05 CN disclosed
CN-106715622-B Radical polymerization type adhesive composition and method for producing electric connection body 迪睿合株式会社 2020-09-04 CN disclosed
US-10663863-B2 Method of producing layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2020-05-26 US disclosed
CN-105575775-B Layer structure and the method and semiconductor device for manufacturing its method, forming pattern 三星SDI株式会社 2019-08-13 CN disclosed
US-10312074-B2 Method of producing layer structure, layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2019-06-04 US disclosed
US-20170115572-A1 METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2017-04-27 US disclosed
US-20160126088-A1 METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-05-05 US disclosed
US-20010005639-A1 Method for coating a resist film and resist coater YONAHA SHINYA (JP) 2001-06-28 US disclosed
US-6251487-B1 Method for coating a resist film NEC CORPORATION (JP) 2001-06-26 US disclosed
US-5856561-A Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-05 US disclosed