Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.61 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | IDO1 | P14902 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.38 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | CA4 | P22748 | 2/20 | 0.36 |
| ▸ | CA6 | P23280 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30004166 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL23271839 | 0.89 | ALDH1A1 (0.48) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL30003187 | 0.89 | ALDH1A1 (0.48) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL23271962 | 0.83 | SMN1; SMN2 (0.42) | KDM4EALDH1A1MAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL15926953 | 0.83 | KDM4E (0.42) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL30003453 | 0.83 | SMN1; SMN2 (0.42) | KDM4EALDH1A1MAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL30003482 | 0.78 | PTGER4 (0.46) | KDM4EALDH1A1MAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL23271646 | 0.78 | PTGER4 (0.46) | KDM4EALDH1A1MAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL23271852 | 0.77 | ALDH1A1 (0.61) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL30003354 | 0.77 | ALDH1A1 (0.61) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230400770-A1 | Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230400770-A1 | Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| EP-4290309-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-13 | — | — | EP | disclosed |
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2023-03-28 | — | — | US | disclosed |
| EP-4012500-B1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2023-03-01 | — | — | EP | disclosed |
| EP-3923074-B1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2023-02-22 | — | — | EP | disclosed |
| CN-110891980-B | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2022-09-30 | — | — | CN | disclosed |
| EP-4012500-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-15 | — | — | EP | disclosed |
| US-20220163890-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-26 | — | — | US | disclosed |
| US-20210397092-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210122692-A1 | RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-04-29 | — | — | US | disclosed |
| CN-110891980-A | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2020-03-17 | — | — | CN | disclosed |
| US-20180011405-A1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING RESIST UNDERLAYER FILM, AND COMPOUND FOR RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| JP-2001081116-A | ACTIVE ENERGY RAY CURING TYPE COMPOSITION AND FORMATION OF FILM USING THE SAME COMPOSITION | KANSAI PAINT CO LTD | 2001-03-27 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11613509-B2 | Radical polymerization control agent and radical polymerization control method | PPOX, NOX4, CROCC | KDM4E 1028/4885ALDH1A1 1023/4885MAPK1 3189/4885 |
| US-20210122692-A1 | RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD | PPOX, NOX4, CROCC | KDM4E 1028/4885ALDH1A1 1023/4885MAPK1 3189/4885 |
| US-20210397092-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | PRDM9, PRDM7, SETD7 | KDM4E 254/4885ALDH1A1 4302/4885MAPK1 1252/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.