SCHEMBL7794936

SCHEMBL7794936

C=Cc1ccc(COCC(F)(F)F)cc1

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.53
MAPT P10636 2/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2C19 P33261 1/20 0.37
RAB9A P51151 1/20 0.37
IDO1 P14902 2/20 0.36
MAPK1 P28482 1/20 0.35
GAA P10253 2/20 0.33
KDM4E B2RXH2 1/20 0.33
POLB P06746 1/20 0.33
TACR1 P25103 1/20 0.33
LMNA P02545 1/20 0.33
TSHR P16473 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11953279 0.86 ALDH1A1 (0.42) ALDH1A1MAPTMEN1KMT2ACYP3A4
SCHEMBL8621935 0.86 ALDH1A1 (0.39) ALDH1A1MAPTIDO1GAAKDM4E
SCHEMBL18573326 0.84 ALDH1A1 (0.41) ALDH1A1MAPTMEN1KMT2ACYP3A4
SCHEMBL7790933 0.83 ALDH1A1 (0.37) ALDH1A1MAPTGAAKDM4EPOLB
SCHEMBL16434742 0.83 ALDH1A1 (0.37) ALDH1A1MAPTMEN1KMT2ACYP3A4
SCHEMBL7795363 0.82 ALDH1A1 (0.38) ALDH1A1IDO1TSHR
SCHEMBL5066935 0.82 ALDH1A1 (0.55) ALDH1A1MAPTMEN1KMT2ACYP3A4
SCHEMBL19429021 0.81 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AGAAKDM4E
SCHEMBL18561111 0.80 ALDH1A1 (0.39) ALDH1A1MAPTMEN1KMT2ACYP3A4
SCHEMBL7793946 0.80 APP (0.40) ALDH1A1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-61293943-A None JP disclosed
US-20220128906-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING PHOTORESIST PATTERNS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-04-28 US disclosed
US-11117162-B2 Epilamization agent comprising a cleavable linking group and epilamization method using such an epilamization agent THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD (CH) 2021-09-14 US disclosed
EP-3070133-B1 TIMEPIECE OR PIECE OF JEWELLERY COMPRISING A SURFACE COVERED WITH AN EPILAME AGENT AND METHOD FOR EPILAMING SUCH A SUBSTRATE SWATCH GROUP RES & DEV LTD (CH) 2019-02-20 EP disclosed
US-20180057629-A1 SUBSTRATE INCLUDING A SURFACE COATED WITH AN EPILAME AGENT AND METHOD FOR COATING SUCH A SUBSTRATE WITH EPILAME THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD (CH) 2018-03-01 US disclosed
EP-3070152-B1 SUBSTRATE COMPRISING A SURFACE COVERED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMING SUCH A SUBSTRATE SWATCH GROUP RES & DEV LTD (CH) 2018-02-28 EP disclosed
US-20160272842-A1 SUBSTRATE COMPRISING A SURFACE COATED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMIZATION OF SUCH A SUBSTRATE THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD (CH) 2016-09-22 US disclosed
US-20160272842-A1 SUBSTRATE COMPRISING A SURFACE COATED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMIZATION OF SUCH A SUBSTRATE THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD (CH) 2016-09-22 US disclosed
US-20160272749-A1 SUBSTRATE COMPRISING A SURFACE COATED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMIZATION OF SUCH A SUBSTRATE THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD (CH) 2016-09-22 US disclosed
US-20160272749-A1 SUBSTRATE COMPRISING A SURFACE COATED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMIZATION OF SUCH A SUBSTRATE THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD (CH) 2016-09-22 US disclosed
EP-3070152-A1 SUBSTRATE COMPRISING A SURFACE COVERED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMING SUCH A SUBSTRATE The Swatch Group Research and Development Ltd. (CH) 2016-09-21 EP disclosed
EP-3070133-A1 SUBSTRATE COMPRISING A SURFACE COVERED WITH AN EPILAME AGENT AND METHOD FOR EPILAMING SUCH A SUBSTRATE The Swatch Group Research and Development Ltd. (CH) 2016-09-21 EP disclosed
EP-0729041-B1 Water-Absorptive soft contact lens MENICON CO LTD (JP) 2001-11-28 EP disclosed
US-5741830-A COPOLYMER OF A FLUORINE CONTAINING STYRENE DERIVATIVE AND N,N-DIMETHYL(METH)ACRYLAMIDE MENICON CO., LTD. (JP) 1998-04-21 US disclosed
EP-0729041-A2 Water-Absorptive soft contact lens Menicon Co., Ltd. (JP) 1996-08-28 EP disclosed
JP-S61293943-A FLUORINE-CONTAINING STYRENE DERIVATIVE SAGAMI CHEM RES CENTER 1986-12-24 JP disclosed