Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DAO | P14920 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Thiouracil SCHEMBL191107 | 0.82 | — | — | |
| Thiouracil SCHEMBL29948586 | 0.82 | — | — | |
| Thiouracil SCHEMBL9097033 | 0.73 | TP53 (0.54) | — | |
| Thiouracil SCHEMBL11756790 | 0.72 | — | — | |
| Thiouracil SCHEMBL4958658 | 0.70 | ATAD2 (0.36) | — | |
| Thiouracil SCHEMBL11777980 | 0.70 | — | — | |
| Methylthiouracil SCHEMBL23628579 | 0.68 | UHRF1 (0.32) | — | |
| Thiouracil SCHEMBL11751555 | 0.66 | — | — | |
| Thiouracil SCHEMBL11759356 | 0.64 | MEN1 (0.32) | — | |
| Uracil SCHEMBL11069645 | 0.61 | CRBN (0.55) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100367111-C | Lithographic gap-filler forming composition | NISSAN CHEMICAL IND LTD (JP) | 2008-02-06 | — | — | CN | disclosed |
| CN-1440518-A | Lithographic gap-filler forming composition | NISSAN CHEMICAL IND LTD (JP) | 2003-09-03 | — | — | CN | disclosed |
| EP-0823661-B1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO LTD (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |