SCHEMBL7804651

SCHEMBL7804651

CCCC(c1ccc(O)cc1)(c1ccc(O)cc1)c1ccc(CCCc2ccc(O)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.56
ADRA2A P08913 2/20 0.56
ADORA3 P0DMS8 2/20 0.56
TACR2 P21452 2/20 0.56
SLC6A2 P23975 2/20 0.56
SLC6A4 P31645 2/20 0.56
SLC6A3 Q01959 2/20 0.56
KDM4E B2RXH2 1/20 0.56
ALDH1A1 P00352 1/20 0.56
LMNA P02545 1/20 0.56
SHBG P04278 1/20 0.56
TP53 P04637 1/20 0.56
CYP3A4 P08684 1/20 0.56
HSPD1 P10809 1/20 0.56
ADRB3 P13945 1/20 0.56
HTR2C P28335 1/20 0.56
HSPE1 P61604 1/20 0.56
HIF1A Q16665 1/20 0.56
TST Q16762 1/20 0.56
HSD17B10 Q99714 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL673356 0.87 ESR1 (0.68) ESR1SLC6A2SLC6A4SLC6A3ALDH1A1
SCHEMBL7876493 0.85 ESR1 (0.55) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL10776870 0.81 ESR1 (0.61) ESR1SLC6A2SLC6A4SLC6A3LMNA
SCHEMBL8735323 0.81 ESR1 (0.56) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL312177 0.79 ESR1 (0.59) ESR1ALDH1A1LMNACYP3A4ESR2
SCHEMBL7806611 0.79 ESR1 (0.64) ESR1SLC6A2SLC6A4SLC6A3ALDH1A1
SCHEMBL28757107 0.79 ESR1 (0.59) ESR1ALDH1A1LMNACYP3A4ESR2
SCHEMBL3020449 0.79 ESR1 (0.70) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL3912940 0.78 ALDH1A1 (0.38) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL6743316 0.77 ESR1 (0.62) ESR1ADRA2AADORA3TACR2SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed