SCHEMBL8735323

SCHEMBL8735323

Oc1ccc(CCC(c2ccc(O)cc2)(c2ccc(O)cc2)c2ccc(O)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.56
ESR2 Q92731 7/20 0.56
KMT2A Q03164 2/20 0.50
MEN1 O00255 1/20 0.50
CA2 P00918 1/20 0.50
ADRA2A P08913 3/20 0.48
SLC6A2 P23975 3/20 0.48
KDM4E B2RXH2 2/20 0.48
ALDH1A1 P00352 2/20 0.48
HTR1A P08908 1/20 0.48
CYP2C19 P33261 1/20 0.48
HTR3A P46098 1/20 0.48
BACE1 P56817 1/20 0.48
TAAR1 Q96RJ0 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
BLM P54132 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
LTA4H P09960 1/20 0.46
MIF P14174 1/20 0.44
TMEM97 Q5BJF2 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20492109 0.88 KIF11 (0.53) ESR1ESR2SLC6A2KDM4EALDH1A1
SCHEMBL8408018 0.83 ESR1 (0.52) ESR1ESR2KMT2AMEN1CA2
SCHEMBL6536649 0.82 ESR1 (0.59) ESR1ESR2KMT2AMEN1CA2
SCHEMBL7804651 0.81 ESR1 (0.56) ESR1ESR2KMT2AMEN1ADRA2A
SCHEMBL219016 0.78 ESR1 (0.56) ESR1ESR2KMT2AMEN1CA2
SCHEMBL18481 0.78 ESR1 (0.64) ESR1ESR2KMT2AMEN1CA2
SCHEMBL8731649 0.78 ESR1 (0.50) ESR1ESR2KMT2AMEN1CA2
SCHEMBL3179897 0.78 ESR1 (0.50) ESR1ESR2KMT2AMEN1CA2
SCHEMBL156830 0.76 ESR1 (0.61) ESR1ESR2KMT2AMEN1CA2
SCHEMBL29109681 0.76 ESR1 (0.54) ESR1ESR2KMT2AMEN1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0555861-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-11-11 EP disclosed
US-5340688-A Containing mixture of 1,2-naphthoquinonediazidosulfonate esters of polyhydroxy compounds and alkali soluble resin FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US disclosed
US-5318875-A Resolution; heat resistance; photosensitivity; developability; integrated circuits; semiconductors FUJI PHOTO FILM CO., LTD. (JP) 1994-06-07 US disclosed
EP-0555861-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1993-08-18 EP disclosed