Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.65 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.65 |
| ▸ | HPGD | P15428 | 2/20 | 0.65 |
| ▸ | CISD1 | Q9NZ45 | 2/20 | 0.65 |
| ▸ | SLC16A3 | O15427 | 1/20 | 0.65 |
| ▸ | SLC16A1 | P53985 | 1/20 | 0.65 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.62 |
| ▸ | MEN1 | O00255 | 4/20 | 0.62 |
| ▸ | EGFR | P00533 | 1/20 | 0.57 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.57 |
| ▸ | PKM | P14618 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.57 |
| ▸ | BLM | P54132 | 1/20 | 0.57 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.57 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13376833 | 1.00 | ALDH1A1 (0.65) | ALDH1A1KDM4ECYP3A4HPGDCISD1 | |
| SCHEMBL782202 | 1.00 | ALDH1A1 (0.65) | ALDH1A1KDM4ECYP3A4HPGDCISD1 | |
| SCHEMBL10413551 | 0.93 | KDM4E (0.59) | ALDH1A1KDM4ECYP3A4HPGDCISD1 | |
| SCHEMBL10413552 | 0.93 | KDM4E (0.59) | ALDH1A1KDM4ECYP3A4HPGDCISD1 | |
| SCHEMBL5337190 | 0.87 | ALDH1A1 (0.54) | ALDH1A1KDM4EKMT2AMEN1EGFR | |
| SCHEMBL19506137 | 0.87 | EGFR (0.65) | ALDH1A1KDM4ECYP3A4HPGDCISD1 | |
| SCHEMBL14413763 | 0.87 | ALDH1A1 (0.54) | ALDH1A1KDM4EKMT2AMEN1EGFR | |
| SCHEMBL21457723 | 0.85 | ALDH1A1 (0.60) | ALDH1A1KDM4ESLC16A1KMT2AMEN1 | |
| SCHEMBL21457302 | 0.85 | ALDH1A1 (0.53) | ALDH1A1KDM4ECISD1SLC16A1KMT2A | |
| SCHEMBL21457305 | 0.85 | ALDH1A1 (0.53) | ALDH1A1KDM4ECISD1SLC16A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4735958-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2026-05-06 | — | — | EP | claimed |
| WO-2025006431-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. (US) | 2025-01-02 | — | — | WO | claimed |
| US-20070224688-A1 | Peptide or protein-capturing surfaces for high throughput MALDI mass spectrometry | FEUER BERNICE I | 2007-09-27 | — | — | US | claimed |
| US-20060261267-A1 | Composite MALDI matrix material and methods of using it and kits thereof in MALDI | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH | 2006-11-23 | — | — | US | claimed |
| US-20040043497-A1 | Peptide or protein-capturing surfaces for high throughput MALDI mass spectrometry | CORNING INCORPORATED | 2004-03-04 | — | — | US | claimed |
| EP-4735958-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2026-05-06 | — | — | EP | disclosed |
| WO-2025006431-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. (US) | 2025-01-02 | — | — | WO | disclosed |
| EP-3485076-B1 | CLEANING AGENT IDENTIFICATION | HENKEL AG & CO KGAA (DE) | 2022-11-02 | — | — | EP | disclosed |
| EP-3553097-B1 | COPOLYMER AND OPTICAL FILM USING SAME | TOSOH CORP (JP) | 2022-05-04 | — | — | EP | disclosed |
| US-11225540-B2 | Copolymer and optical film using same | TOSOH CORPORATION (JP) | 2022-01-18 | — | — | US | disclosed |
| EP-3812414-A1 | HIGH IV MELT PHASE POLYESTER POLYMER CATALYZED WITH ANTIMONY CONTAINING COMPOUNDS | GRUPO PETROTEMEX, S.A. DE C.V. (MX) | 2021-04-28 | — | — | EP | disclosed |
| EP-2518096-B1 | HIGH IV MELT PHASE POLYESTER POLYMER CATALYZED WITH ANTIMONY CONTAINING COMPOUNDS | GRUPO PETROTEMEX SA DE CV (MX) | 2021-04-21 | — | — | EP | disclosed |
| WO-1989007622-A1 | CONDENSATION POLYMER CONTAINING THE RESIDUE OF AN ACYLOXYSTYRYL COMPOUND AND SHAPED ARTICLES PRODUCED THEREFROM | EASTMAN KODAK COMPANY (US) | 1989-08-24 | — | — | WO | disclosed |
| US-4826903-A | Condensation polymer containing the residue of an acyloxystyrl compound and shaped articles produced therefrom | EASTMAN KODAK COMPANY (US) | 1989-05-02 | — | — | US | disclosed |
| EP-0217823-A1 | UV-ABSORBING CONDENSATION POLYMERIC COMPOSITIONS AND PRODUCTS THEREFROM. | EASTMAN KODAK CO (US) | 1987-04-15 | — | — | EP | disclosed |
| US-4617374-A | POLYESTERS HAVING A METHINE COMPOUND END-GROUP; BEVERAGE BOTTLES; MOLDINGS | EASTMAN KODAK COMPANY (US) | 1986-10-14 | — | — | US | disclosed |
| WO-1986004903-A1 | UV-ABSORBING CONDENSATION POLYMERIC COMPOSITIONS AND PRODUCTS THEREFROM | EASTMAN KODAK COMPANY (US) | 1986-08-28 | — | — | WO | disclosed |
| US-4284621-A | SUNSCREEN FOR SKIN | BAYER AKTIENGESELLSCHAFT (DE) | 1981-08-18 | — | — | US | disclosed |
| US-4158658-A | Bichromophoric benzoxazole-styrene ultraviolet stabilizers and their use in organic compositions | EASTMAN KODAK COMPANY (US) | 1979-06-19 | — | — | US | disclosed |
| US-4075162-A | BICHROMOPHORIC BENZOXAZOLE-STYRENE ULTRAVIOLET STABILIZERS AND THEIR USE IN ORGANIC COMPOSITIONS | EASTMAN KODAK COMPANY (US) | 1978-02-21 | — | — | US | disclosed |