SCHEMBL7826055

SCHEMBL7826055

O=C(O)CCS(=O)(=O)c1ccc2ccccc2c1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.68
HTT P42858 4/20 0.68
KDM4E B2RXH2 2/20 0.65
HPGD P15428 1/20 0.65
NPSR1 Q6W5P4 1/20 0.55
CYP1A2 P05177 2/20 0.53
GAA P10253 2/20 0.52
HDAC3 O15379 1/20 0.50
HDAC4 P56524 1/20 0.50
HDAC1 Q13547 1/20 0.50
HDAC7 Q8WUI4 1/20 0.50
HDAC2 Q92769 1/20 0.50
HDAC10 Q969S8 1/20 0.50
HDAC11 Q96DB2 1/20 0.50
HDAC8 Q9BY41 1/20 0.50
HDAC6 Q9UBN7 1/20 0.50
HDAC9 Q9UKV0 1/20 0.50
HDAC5 Q9UQL6 1/20 0.50
LMNA P02545 1/20 0.49
HSD11B1 P28845 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5271948 0.90 ALDH1A1 (0.63) ALDH1A1HTTKDM4EHPGDCYP1A2
SCHEMBL10335829 0.85 ALDH1A1 (0.68) ALDH1A1HTTKDM4EHPGDCYP1A2
SCHEMBL947731 0.84 ALDH1A1 (0.56) ALDH1A1HTTKDM4EHPGDNPSR1
SCHEMBL948719 0.84 ALDH1A1 (0.56) ALDH1A1HTTKDM4EHPGDNPSR1
SCHEMBL14029051 0.83 GAA (0.63) ALDH1A1HTTKDM4EHPGDGAA
SCHEMBL950224 0.81 ALDH1A1 (0.54) ALDH1A1HTTKDM4EHPGDNPSR1
SCHEMBL947223 0.80 ALDH1A1 (0.52) ALDH1A1HTTKDM4EHPGDNPSR1
SCHEMBL950209 0.80 ALDH1A1 (0.52) ALDH1A1HTTKDM4EHPGDNPSR1
SCHEMBL1001018 0.80 HSD11B1 (0.69) ALDH1A1HTTKDM4ENPSR1HDAC3
SCHEMBL948303 0.79 KDM4E (0.78) ALDH1A1HTTKDM4EHPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-20180282165-A1 METHOD OF FORMING A MULTILAYER STRUCTURE ROHM & HAAS ELECT MAT (US) 2018-10-04 US disclosed
US-9910354-B2 Resist underlayer film-forming composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-9910354-B2 Resist underlayer film-forming composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed
US-20170045820-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed
US-20170045820-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed
CN-1314906-A Salts of paroxetine SMITHKLINE BEECHAM PLC (GB) 2001-09-26 CN disclosed
EP-1091958-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2001-04-18 EP disclosed
WO-2000001692-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2000-01-13 WO disclosed