SCHEMBL7848948

SCHEMBL7848948

O=C(NC1CCN(Cc2ccccc2)CC1)NS(=O)(=O)c1ccc2c(c1)CCN(C(=O)C(F)(F)F)CC2

nearest known ligand 0.54

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CCR3 P51677 2/20 0.54
KMT2A Q03164 6/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
MEN1 O00255 1/20 0.50
PKM P14618 1/20 0.50
UBE2M P61081 2/20 0.48
DCUN1D1 Q96GG9 2/20 0.48
DRD4 P21917 3/20 0.48
LMNA P02545 2/20 0.47
DRD2 P14416 1/20 0.47
DRD3 P35462 1/20 0.47
MCHR1 Q99705 1/20 0.47
SIGMAR1 Q99720 4/20 0.46
ALDH1A1 P00352 2/20 0.46
POLB P06746 1/20 0.46
PDK1 Q15118 1/20 0.45
PDK2 Q15119 1/20 0.45
PDK3 Q15120 1/20 0.45
PDK4 Q16654 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7848872 0.92 KMT2A (0.49) CCR3KMT2ASMN1; SMN2MEN1PKM
SCHEMBL7848873 0.90 CCR3 (0.59) CCR3KMT2ASMN1; SMN2MEN1PKM
SCHEMBL7848854 0.84 HDAC3 (0.57) KMT2ASMN1; SMN2MEN1PKMLMNA
SCHEMBL6802404 0.80 SMN1; SMN2 (0.56) KMT2ASMN1; SMN2MEN1LMNAALDH1A1
SCHEMBL7855189 0.80 KMT2A (0.54) CCR3KMT2ASMN1; SMN2MEN1PKM
SCHEMBL7848867 0.75 KMT2A (0.51) CCR3KMT2ASMN1; SMN2MEN1PKM
SCHEMBL7849483 0.75 HDAC3 (0.56) KMT2ASMN1; SMN2MEN1PKMLMNA
SCHEMBL7847020 0.73 KMT2A (0.49) KMT2ASMN1; SMN2MEN1PKMDRD4
Hydrochloric Acid SCHEMBL7551006 0.73 LMNA (0.45) KMT2ASMN1; SMN2MEN1PKMLMNA
Hydrochloric Acid SCHEMBL8123446 0.73 LMNA (0.45) KMT2ASMN1; SMN2MEN1PKMLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122252-A1 NITROGENOUS FUSED HETEROCYCLE COMPOUNDS, PROCESS FOR THE PREPARATION THEREOF AND AGENTS CONTAINING THE SAME Takeda Chemical Industries, Ltd. (JP) 2001-08-08 EP disclosed