SCHEMBL785890

SCHEMBL785890

CCC(C)C(=O)OC(C)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
KMT2A Q03164 4/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
EPHX2 P34913 1/20 0.35
LMNA P02545 1/20 0.35
CYP17A1 P05093 3/20 0.34
CYP19A1 P11511 3/20 0.34
MEN1 O00255 3/20 0.34
PRKCA P17252 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12149433 0.82 BLM (0.35) ALDH1A1EPHX2CYP17A1CYP19A1PRKCA
SCHEMBL786179 0.80 CYP19A1 (0.46) ALDH1A1KMT2ASMN1; SMN2EPHX2LMNA
SCHEMBL13932771 0.79 CYP17A1 (0.32) ALDH1A1CYP17A1CYP19A1
SCHEMBL2739853 0.78 CYP17A1 (0.38) ALDH1A1SMN1; SMN2EPHX2LMNACYP17A1
SCHEMBL14278496 0.78 ALDH1A1 (0.46) ALDH1A1KMT2ASMN1; SMN2EPHX2LMNA
SCHEMBL14556887 0.76 ALDH1A1 (0.31) ALDH1A1
SCHEMBL785888 0.76 ALDH1A1 (0.39) ALDH1A1KMT2ASMN1; SMN2EPHX2LMNA
SCHEMBL107056 0.76 CYP19A1 (0.35) ALDH1A1KMT2ASMN1; SMN2EPHX2CYP17A1
SCHEMBL14422361 0.76 CYP17A1 (0.36) ALDH1A1SMN1; SMN2EPHX2LMNACYP17A1
SCHEMBL2740746 0.74 CYP17A1 (0.35) ALDH1A1EPHX2LMNACYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8859180-B2 Copolymer and composition for semiconductor lithography and process for producing the copolymer MARUZEN PETROCHEMICAL CO., LTD. (JP) 2014-10-14 US disclosed
US-8859180-B2 Copolymer and composition for semiconductor lithography and process for producing the copolymer MARUZEN PETROCHEMICAL CO., LTD. (JP) 2014-10-14 US disclosed
US-8211615-B2 Copolymer for immersion lithography and compositions MARUZEN PETROCHEMICAL CO., LTD. (JP) 2012-07-03 US disclosed
US-20120071638-A1 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2012-03-22 US disclosed
US-8067516-B2 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2011-11-29 US disclosed
US-20100062371-A1 Copolymer and composition for semiconductor lithography and process for producing the copolymer MARUZEN PETROCHEMICAL CO., LTD (JP) 2010-03-11 US disclosed
US-20100047710-A1 COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS MARUZEN PETROCHEMICAL CO., LTD (JP) 2010-02-25 US disclosed
US-20070269741-A1 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2007-11-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120071638-A1 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography FRG1, H1-10, POLL ALDH1A1 3739/4885KMT2A 1497/4885SMN1; SMN2 3508/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.