⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10068116 | 0.84 | — | — | |
| SCHEMBL786053 | 0.83 | LMNA (0.33) | — | |
| SCHEMBL786064 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL786044 | 0.77 | CTSK (0.32) | — | |
| SCHEMBL785896 | 0.76 | CTSK (0.34) | — | |
| SCHEMBL14015832 | 0.75 | ALDH1A1 (0.43) | — | |
| SCHEMBL10068108 | 0.75 | — | — | |
| SCHEMBL785925 | 0.74 | EPHX2 (0.34) | — | |
| SCHEMBL15159952 | 0.73 | TSHR (0.48) | — | |
| SCHEMBL786134 | 0.72 | EPHX2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-8067516-B2 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |