SCHEMBL7880926

SCHEMBL7880926

CC(C)(C)OC(=O)Oc1cccc2c1ccc1ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.48
HSD17B10 Q99714 3/20 0.48
GAA P10253 2/20 0.48
PGR P06401 1/20 0.48
PTGS1 P23219 1/20 0.48
MAPK1 P28482 1/20 0.48
KDM4E B2RXH2 3/20 0.47
KMT2A Q03164 3/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
MEN1 O00255 1/20 0.43
RAB9A P51151 1/20 0.43
HPRT1 P00492 1/20 0.41
HPGD P15428 3/20 0.40
ELANE P08246 1/20 0.40
MAPT P10636 1/20 0.40
POLB P06746 1/20 0.39
NCEH1 Q6PIU2 3/20 0.39
MMP2 P08253 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
FABP7 O15540 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2738440 0.91 ALDH1A1 (0.57) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL4059205 0.87 ELANE (0.49) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL18817858 0.86 HSD17B10 (0.53) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28684572 0.83 HSD17B10 (0.55) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL14087507 0.81 ESR1 (0.47) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL21448472 0.81 ALDH1A1 (0.45) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28683213 0.81 ALDH1A1 (0.49) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL22724977 0.80 ESR1 (0.46) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28689978 0.80 ALDH1A1 (0.54) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL11152562 0.80 ALDH1A1 (0.54) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6168897-B1 PATTERNWISE-EXPOSING THE LAMINATED LAYER COMPRISING LIGHT SENSITIVE LAYER AND FLUORESCENT LIGHT-GENERATING LAYER TO ELECTROMAGNETIC RADIATION AND AN ELECTRON BEAM TO GENERATE A FLUORESCENT LIGHT CAUSING PHOTOCHEMICAL REACTION, DEVELOPING KABUSHIKI KAISHA TOSHIBA (JP) 2001-01-02 US disclosed
US-5928841-A Method of photoetching at 180 to 220 KABUSHIKI KAISHA TOSHIBA (JP) 1999-07-27 US disclosed