Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B1 | P14061 | 1/20 | 0.64 |
| ▸ | ESR1 | P03372 | 8/20 | 0.55 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.55 |
| ▸ | DRD2 | P14416 | 4/20 | 0.54 |
| ▸ | DRD1 | P21728 | 4/20 | 0.54 |
| ▸ | DRD5 | P21918 | 3/20 | 0.54 |
| ▸ | DRD3 | P35462 | 3/20 | 0.54 |
| ▸ | MAOA | P21397 | 2/20 | 0.48 |
| ▸ | MAOB | P27338 | 2/20 | 0.48 |
| ▸ | PRKCI | P41743 | 1/20 | 0.48 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | CA4 | P22748 | 1/20 | 0.47 |
| ▸ | CA6 | P23280 | 1/20 | 0.47 |
| ▸ | DRD4 | P21917 | 1/20 | 0.47 |
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29439100 | 1.00 | HSD17B1 (0.64) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL217399 | 0.89 | KDM4E (0.59) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL29373696 | 0.89 | KDM4E (0.59) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL24727048 | 0.87 | ESR1 (0.56) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL6536288 | 0.87 | HSD17B1 (0.53) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL15869784 | 0.87 | HSD17B1 (0.58) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL21318766 | 0.86 | — | — | |
| SCHEMBL30672580 | 0.86 | — | — | |
| SCHEMBL14317167 | 0.86 | DRD1 (0.61) | HSD17B1ESR1ESR2DRD2DRD1 | |
| SCHEMBL784291 | 0.83 | MAOB (0.59) | HSD17B1ESR1ESR2DRD2MAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024221958-A1 | PREPARATION METHOD FOR MODIFIED POLYETHERSULFONE/POLYETHERIMIDE POLYMER ALLOY | 深圳先进技术研究院 | 2024-10-31 | — | — | WO | claimed |
| CN-116675861-A | Preparation method of modified polyethersulfone/polyetherimide polymer alloy | 深圳先进技术研究院 | 2023-09-01 | — | — | CN | claimed |
| CN-114316232-B | Polyester resin for high-hardness high-transparency powder coating and preparation method thereof | 广东腐蚀科学与技术创新研究院 | 2023-04-14 | — | — | CN | claimed |
| CN-115819712-A | Low-dielectric-property thermoplastic polyurethane elastomer, and preparation method and application thereof | 万华化学集团股份有限公司 | 2023-03-21 | — | — | CN | claimed |
| CN-114316232-A | Polyester resin for high-hardness high-transparency powder coating and preparation method thereof | 广东腐蚀科学与技术创新研究院 | 2022-04-12 | — | — | CN | claimed |
| CN-109721701-B | Thermoplastic polyurethane elastomer composition, preparation method and application thereof | 万华化学集团股份有限公司 | 2021-09-03 | — | — | CN | claimed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| WO-2024221958-A1 | PREPARATION METHOD FOR MODIFIED POLYETHERSULFONE/POLYETHERIMIDE POLYMER ALLOY | 深圳先进技术研究院 | 2024-10-31 | — | — | WO | disclosed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-114206990-B | Fiber-reinforced polyarylene sulfide copolymer composite substrate, method for producing same, and molded article containing same | 东丽株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-113816854-B | Polymerizable compound based on 2, 7-dihydroxyfluorene and preparation method and application thereof | 江苏创拓新材料有限公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-113816854-B | Polymerizable compound based on 2, 7-dihydroxyfluorene and preparation method and application thereof | 江苏创拓新材料有限公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-115989267-B | Method for producing polyarylene sulfide, method for producing polyarylene sulfide copolymer, and polyarylene sulfide | 东丽株式会社 | 2024-03-29 | — | — | CN | disclosed |
| US-4217407-A | Light-sensitive O-quinone diazide containing copying material | FUJI PHOTO FILM CO., LTD. (JP) | 1980-08-12 | — | — | US | disclosed |
| US-4207106-A | Positive working O-quinone diazide photocopying process with organic resin overlayer | FUJI PHOTO FILM CO., LTD. (JP) | 1980-06-10 | — | — | US | disclosed |
| US-4197128-A | Light-sensitive O-quinone diazide containing copying material | FUJI PHOTO FILM CO., LTD. (JP) | 1980-04-08 | — | — | US | disclosed |
| US-4191573-A | O-QUINONE DIAZIDE, AN ALKALI-SOLUBLE ARYL AZIDE, A POLYAMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-03-04 | — | — | US | disclosed |
| US-4041165-A | TREATING DELAYED HYPERSENSITIVITY | RICHARDSON-MERRELL INC. (US) | 1977-08-09 | — | — | US | disclosed |
| US-3947593-A | ANTIVIRUL AGENTS | RICHARDSON-MERRELL INC. (US) | 1976-03-30 | — | — | US | disclosed |
| US-3937833-A | DELAYED HYPERSENSITIVITY | RICHARDSON-MERRELL INC. (US) | 1976-02-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | HSD17B1 3966/4885ESR1 119/4885ESR2 436/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.