SCHEMBL7889308

SCHEMBL7889308

CCCCOc1ccccc1C(N)=S

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.62
MAPT P10636 2/20 0.62
MEN1 O00255 2/20 0.62
KMT2A Q03164 2/20 0.62
NR1I2 O75469 1/20 0.62
CHRM2 P08172 1/20 0.62
CYP3A4 P08684 1/20 0.62
ADRA2A P08913 1/20 0.62
OPRK1 P41145 1/20 0.62
HTR2B P41595 1/20 0.62
SLC6A3 Q01959 1/20 0.62
HDAC6 Q9UBN7 1/20 0.62
CYP1A2 P05177 1/20 0.56
CYP2C9 P11712 1/20 0.56
CYP2C19 P33261 1/20 0.56
L3MBTL1 Q9Y468 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.47
ALDH1A1 P00352 4/20 0.47
HTT P42858 1/20 0.46
TSHR P16473 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11883203 0.95 LMNA (0.69) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL7897919 0.93 LMNA (0.72) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL7897062 0.93 LMNA (0.72) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL7900711 0.91 LMNA (0.55) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL7897819 0.84 ALDH1A1 (0.60) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL2560081 0.83 LMNA (0.62) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL6835723 0.83 LMNA (0.88) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL2494574 0.82 LMNA (0.60) LMNAMAPTMEN1KMT2ANR1I2
Hydrochloric Acid SCHEMBL11625882 0.81 LMNA (0.60) LMNAMAPTMEN1KMT2ANR1I2
SCHEMBL6671013 0.80 HTR7 (0.54) LMNAMAPTMEN1KMT2ANR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed