SCHEMBL7900709

SCHEMBL7900709

CCCCOc1ccc(-c2ccccc2C(N)=S)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 3/20 0.50
▸ CYP19A1 P11511 3/20 0.50
▸ CYP2C9 P11712 2/20 0.50
▸ CYP2C19 P33261 2/20 0.50
▸ CYP1A2 P05177 1/20 0.50
▸ LTA4H P09960 2/20 0.46
▸ RAB9A P51151 3/20 0.46
▸ KDM4E B2RXH2 2/20 0.46
▸ NPC1 O15118 2/20 0.46
▸ MAPT P10636 2/20 0.46
▸ ALDH1A1 P00352 1/20 0.46
▸ HPGD P15428 1/20 0.46
▸ SMN1; SMN2 Q16637 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ MAOA P21397 1/20 0.46
▸ MAOB P27338 1/20 0.46
▸ PTPN11 Q06124 3/20 0.45
▸ GAA P10253 1/20 0.44
▸ CYP3A4 P08684 1/20 0.44
▸ TP53 P04637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7889276 0.94 PDE10A (0.44) CYP2D6CYP19A1CYP2C9CYP2C19CYP1A2
SCHEMBL7897886 0.88 NQO1 (0.44) LTA4HRAB9AKDM4ENPC1MAPT
SCHEMBL7896294 0.85 FFAR4 (0.40) ALDH1A1MAOAMAOBGAAKCNH2
SCHEMBL7897817 0.83 BCAT2 (0.40) RAB9ANPC1ALDH1A1KCNH2HRH3
SCHEMBL9453349 0.82 MEN1 (0.62) MAPTPTPN11CYP3A4TP53
SCHEMBL7900739 0.81 BRS3 (0.49) —
SCHEMBL1180921 0.80 ABL1 (0.51) CYP2D6CYP2C9CYP2C19CYP1A2RAB9A
SCHEMBL7896980 0.78 PPARG (0.48) KDM4EMAPTALDH1A1CYP3A4TP53
SCHEMBL7896352 0.78 PPARG (0.48) KDM4EMAPTALDH1A1CYP3A4TP53
SCHEMBL28999620 0.77 LTA4H (0.69) LTA4HRAB9AMAOAGAAKCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 — — US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 — — US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 — — US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 — — EP disclosed
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