SCHEMBL7897886

SCHEMBL7897886

CCOc1ccc(-c2ccccc2C(N)=S)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NQO1 P15559 1/20 0.44
▸ PARP10 Q53GL7 1/20 0.44
▸ PRSS1 P07477 1/20 0.44
▸ PRSS2 P07478 1/20 0.44
▸ PRSS3 P35030 1/20 0.44
▸ KDM4E B2RXH2 5/20 0.43
▸ NPC1 O15118 5/20 0.43
▸ MAPT P10636 4/20 0.43
▸ TDP1 Q9NUW8 2/20 0.43
▸ LTA4H P09960 1/20 0.43
▸ FFAR1 O14842 1/20 0.43
▸ FFAR4 Q5NUL3 1/20 0.43
▸ HCRTR1 O43613 1/20 0.43
▸ HCRTR2 O43614 1/20 0.43
▸ MEN1 O00255 1/20 0.43
▸ PKM P14618 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ ADRA2A P08913 1/20 0.42
▸ RAB9A P51151 4/20 0.42
▸ ALDH1A1 P00352 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7889276 0.88 PDE10A (0.44) KDM4ENPC1MAPTLTA4HMEN1
SCHEMBL7900709 0.88 CYP2D6 (0.50) KDM4ENPC1MAPTLTA4HRAB9A
SCHEMBL7897817 0.86 BCAT2 (0.40) NPC1FFAR1FFAR4RAB9AALDH1A1
SCHEMBL4966792 0.84 BCAT2 (0.59) PARP10KDM4ENPC1MAPTFFAR1
SCHEMBL1180921 0.82 ABL1 (0.51) KDM4ENPC1MAPTPKMRAB9A
SCHEMBL7896294 0.82 FFAR4 (0.40) PARP10FFAR4HCRTR1HCRTR2ALDH1A1
SCHEMBL4988323 0.79 NPC1 (0.59) KDM4ENPC1FFAR1FFAR4HCRTR1
SCHEMBL6013603 0.79 NQO1 (0.64) NQO1KDM4ENPC1MAPTTDP1
SCHEMBL7896340 0.79 SMN1; SMN2 (0.52) SMN1; SMN2TP53
SCHEMBL6962967 0.76 BCAT2 (0.46) NPC1MEN1PKMKMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 — — US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 — — US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 — — US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 — — EP disclosed
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