SCHEMBL7907957

SCHEMBL7907957

Nc1ccc(Oc2ccc3cc(Oc4ccc(N)cc4)ccc3c2)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.74
TDP1 Q9NUW8 2/20 0.74
CYP3A4 P08684 1/20 0.74
TSHR P16473 1/20 0.74
MAPT P10636 5/20 0.70
MEN1 O00255 4/20 0.70
KMT2A Q03164 4/20 0.70
SMN1; SMN2 Q16637 3/20 0.70
GAA P10253 2/20 0.70
MITF O75030 1/20 0.70
GFER P55789 1/20 0.70
NLRP1 Q9C000 1/20 0.70
NOD2 Q9HC29 1/20 0.70
MAOA P21397 2/20 0.61
MAOB P27338 2/20 0.58
TEAD4 Q15561 1/20 0.58
POLB P06746 1/20 0.56
NPC1 O15118 2/20 0.54
RAB9A P51151 2/20 0.54
NLRP3 Q96P20 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1368972 0.95 ALDH1A1 (0.67) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL30209491 0.95 ALDH1A1 (0.67) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL1177704 0.91 ALDH1A1 (0.65) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL31536331 0.91 ALDH1A1 (0.65) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL1283859 0.89 SMN1; SMN2 (0.75) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL2013073 0.86 ALDH1A1 (1.00) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL65211 0.86 ALDH1A1 (1.00) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL4455485 0.86 ALDH1A1 (1.00) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL4446167 0.86 ALDH1A1 (1.00) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL10576066 0.86 ALDH1A1 (1.00) ALDH1A1TDP1CYP3A4TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6197920-B1 Formulation for the production of 1, 3-bis (4-aminophenoxy) naphthalene and its polymer CHINA TEXTILE INSTITUTE (TW) 2001-03-06 US disclosed
US-5633112-A Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine HITACHI, LTD. (JP) 1997-05-27 US disclosed
US-5340904-A Polyimides, polyamides, polyamideimide copolymers; heat resistance, mechanical strength, high molecular weight NATIONAL SCIENCE COUNCIL (TW) 1994-08-23 US disclosed