Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | LAP3 | P28838 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7908181 | 0.94 | ALDH1A1 (0.43) | ALDH1A1TSHRLAP3MEN1KMT2A | |
| SCHEMBL7908180 | 0.94 | ALDH1A1 (0.43) | ALDH1A1TSHRLAP3MEN1KMT2A | |
| Nitric Acid SCHEMBL29270163 | 0.85 | — | — | |
| Isopropylamine SCHEMBL10538168 | 0.76 | MEN1 (0.43) | ALDH1A1TSHRLAP3MEN1KMT2A | |
| SCHEMBL29816 | 0.75 | — | — | |
| SCHEMBL8200658 | 0.73 | ALDH1A1 (0.48) | ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL29038799 | 0.73 | — | — | |
| SCHEMBL28858117 | 0.73 | ALDH1A1 (0.59) | ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL5615809 | 0.71 | — | — | |
| SCHEMBL9504478 | 0.71 | LAP3 (0.35) | ALDH1A1TSHRLAP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6197366-B1 | ELECTROCONDUCTIVE METAL FILM FROM LOW TEMPERATURE BAKING FROMNITRATE SALT AND CYANO COMPOUND, CARBONYL COMPOUND OR ORGANIC SALT OF METAL AND AMINO | TAKAMATSU RESEARCH LABORATORY (JP) | 2001-03-06 | — | — | US | disclosed |
| EP-0989205-A1 | METAL PASTE AND METHOD FOR PRODUCTION OF METAL FILM | Takamatsu Research Laboratory (JP) | 2000-03-29 | — | — | EP | disclosed |