Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2316860 | 0.78 | DNM1 (0.46) | ALDH1A1TSHR | |
| SCHEMBL2862407 | 0.76 | TSHR (0.33) | TSHR | |
| SCHEMBL14860315 | 0.76 | ALDH1A1 (0.46) | ALDH1A1TSHRMEN1KMT2AHPGD | |
| SCHEMBL12097988 | 0.76 | ALDH1A1 (0.46) | ALDH1A1TSHRMEN1KMT2AHPGD | |
| SCHEMBL7908180 | 0.73 | ALDH1A1 (0.43) | ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL7908181 | 0.73 | ALDH1A1 (0.43) | ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL7908183 | 0.73 | ALDH1A1 (0.43) | ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL8193369 | 0.73 | TSHR (0.42) | ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL11184354 | 0.72 | TSHR (0.31) | TSHR | |
| SCHEMBL191974 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4720206-A1 | INVISIBLE FLUORESCENT SOLVENT INK JET INK COMPOSITIONS | Videojet Technologies, Inc. (US) | 2026-04-08 | — | — | EP | disclosed |
| US-20260062581-A1 | INVISIBLE FLUORESCENT SOLVENT INK JET INK COMPOSITIONS | VIDEOJET TECHNOLOGIES INC. (US) | 2026-03-05 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4655359-A1 | SOFT PIGMENTED CONTINUOUS INK JET INK COMPOSITIONS | Videojet Technologies, Inc. (US) | 2025-12-03 | — | — | EP | disclosed |
| US-20250346772-A1 | SOFT PIGMENTED CONTINUOUS INK JET INK COMPOSITIONS | VIDEOJET TECHNOLOGIES INC. (US) | 2025-11-13 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| WO-2012125401-A1 | NOVEL ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2012-09-20 | — | — | WO | disclosed |
| US-20120231632-A1 | Novel Etching Composition | FUJIFILM CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-6165341-A | Catalytic film, methods of making the catalytic films, and electrosynthesis of compounds using the catalytic film | SACHEM, INC. (US) | 2000-12-26 | — | — | US | disclosed |
| EP-1021595-A2 | ELECTROSYNTHESIS OF HYDROXYLAMMONIUM SALTS AND HYDROXYLAMINE USING A MEDIATOR, A CATALYTIC FILM, METHODS OF MAKING THE CATALYTIC FILM, AND ELECTROSYNTHESIS OF COMPOUNDS USING THE CATALYTIC FILM | SACHEM, INC. (US) | 2000-07-26 | — | — | EP | disclosed |
| WO-1999009234-A2 | ELECTROSYNTHESIS OF HYDROXYLAMMONIUM SALTS AND HYDROXYLAMINE USING A MEDIATOR, A CATALYTIC FILM, METHODS OF MAKING THE CATALYTIC FILM, AND ELECTROSYNTHESIS OF COMPOUNDS USING THE CATALYTIC FILM | SACHEM, INC. (US) | 1999-02-25 | — | — | WO | disclosed |
| EP-0246825-B1 | QUATERNARY SALT SOLUTION ELECTROLYTE FOR ELECTROLYTIC CAPACITORS | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1991-02-27 | — | — | EP | disclosed |
| US-4774011-A | Electrolyte for aluminum electrolytic capacitor | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1988-09-27 | — | — | US | disclosed |
| EP-0246825-A2 | Quaternary salt solution electrolyte for electrolytic capacitors | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1987-11-25 | — | — | EP | disclosed |
| US-4304614-A | AMMUNITION, DYNAMIC LASERS, FUSES, WELDING | WALKER FRANKLIN E | 1981-12-08 | — | — | US | disclosed |
| US-4196026-A | LOW MOLECULAR WEIGHT | WALKER FRANKLIN E | 1980-04-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | ALDH1A1 4472/4885TSHR 3217/4885MEN1 2326/4885 |
| US-20260062581-A1 | INVISIBLE FLUORESCENT SOLVENT INK JET INK COMPOSITIONS | SRC, NLRP1, NLRP3 | ALDH1A1 1920/4885TSHR 4579/4885MEN1 3416/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | ALDH1A1 4452/4885TSHR 770/4885MEN1 56/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | ALDH1A1 1558/4885TSHR 446/4885MEN1 3287/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.