SCHEMBL7913185

SCHEMBL7913185

CC(C)(C)OC(=O)OC=Cc1ccccc1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.47
LMNA P02545 1/20 0.47
NFKB1 P19838 2/20 0.46
JUN P05412 1/20 0.46
NFE2L2 Q16236 1/20 0.46
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA4 P22748 1/20 0.45
MAPK1 P28482 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
KDM4E B2RXH2 1/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
ATM Q13315 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
CDK4 P11802 1/20 0.42
CCND1 P24385 1/20 0.42
BCHE P06276 1/20 0.41
GUSB P08236 1/20 0.41
TRPA1 O75762 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7888120 0.81 MTNR1A (0.51) MAPTMAPK1KDM4ENPC1RAB9A
SCHEMBL10913657 0.79 CYP2C19 (0.45) MAPTLMNANFKB1TDP1NPC1
SCHEMBL104809 0.79 CYP2C19 (0.45) MAPTLMNANFKB1TDP1NPC1
SCHEMBL434269 0.78 MAPT (0.59) MAPTLMNANFKB1JUNNFE2L2
SCHEMBL11815004 0.78 MAPT (0.59) MAPTLMNANFKB1JUNNFE2L2
SCHEMBL11833868 0.78 MAPT (0.59) MAPTLMNANFKB1JUNNFE2L2
SCHEMBL11833864 0.78 MAPT (0.59) MAPTLMNANFKB1JUNNFE2L2
SCHEMBL27969302 0.77 MAPT (0.46) MAPTLMNANFKB1JUNNFE2L2
SCHEMBL7913182 0.74 MIF (0.48) MAPTLMNANFKB1NFE2L2CA1
SCHEMBL7997478 0.74 CYP2C19 (0.41) MAPTLMNANFKB1TDP1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE37179-E1 ADDITION POLYMER JSR CORPORATION (JP) 2001-05-15 US disclosed
US-5679495-A TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-10-21 US disclosed