SCHEMBL104809

SCHEMBL104809

CC(C)(C)OC(=O)OC=Cc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.45
EGFR P00533 1/20 0.44
GLA P06280 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ALDH1A1 P00352 4/20 0.41
LMNA P02545 3/20 0.41
MAPT P10636 3/20 0.41
HDAC3 O15379 2/20 0.41
HDAC4 P56524 2/20 0.41
HDAC1 Q13547 2/20 0.41
HDAC2 Q92769 2/20 0.41
HDAC8 Q9BY41 2/20 0.41
HDAC6 Q9UBN7 2/20 0.41
PLIN1 O60240 2/20 0.41
RECQL P46063 2/20 0.41
PLIN5 Q00G26 2/20 0.41
ABHD5 Q8WTS1 2/20 0.41
TNKS O95271 1/20 0.41
HCAR2 Q8TDS4 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10913657 1.00 CYP2C19 (0.45) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL7997478 0.94 CYP2C19 (0.41) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL8399644 0.87 PPARA (0.38) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL6393968 0.85 ALDH1A1 (0.42) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL7913182 0.85 MIF (0.48) CYP2C19TDP1ALDH1A1LMNAMAPT
SCHEMBL9128813 0.84 CYP2C19 (0.41) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL9499668 0.83 ALDH1A1 (0.49) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL377478 0.83 HDAC1 (0.52) EGFRGLATDP1ALDH1A1LMNA
SCHEMBL7542602 0.80 ALDH1A1 (0.49) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL7913185 0.79 MAPT (0.47) TDP1LMNAMAPTNPC1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1088 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12535738-B2 Photoresist top coating material for etching rate control TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2026-01-27 US claimed
CN-110256474-A Application of the three silicon amine rare earth compoundings in catalysis carbonic ester and borine reaction 苏州大学 2019-09-20 CN claimed
US-9804494-B2 Method for creating topographical patterns in polymers via surface energy patterned films and the marangoni effect BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2017-10-31 US claimed
EP-1944775-B1 Production of electronic devices FLEXENABLE LTD (GB) 2017-10-25 EP claimed
US-7718235-B2 Overcoat composition for image recording materials EASTMAN KODAK COMPANY (US) 2010-05-18 US claimed
EP-2166543-A1 Production of electronic devices Plastic Logic Limited (GB) 2010-03-24 EP claimed
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 EP claimed
EP-1944775-A1 Production of electronic devices Plastic Logic Limited (GB) 2008-07-16 EP claimed
US-20070141278-A1 OVERCOAT COMPOSITION FOR IMAGE RECORDING MATERIALS BANK OF AMERICA, N.A., AS AGENT 2007-06-21 US claimed
US-20070122744-A1 Positive-working photoresist composition and photosensitive material using same MAEMORI SATOSHI 2007-05-31 US claimed
EP-0291670-B1 VAPOR PHASE PHOTORESIST SILYLATION PROCESS International Business Machines Corporation (US) 1991-02-20 EP claimed
EP-0282724-B1 NEGATIVE RESIST COMPOSITIONS International Business Machines Corporation (US) 1990-12-12 EP claimed
US-4908298-A Method of creating patterned multilayer films for use in production of semiconductor circuits and systems INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1990-03-13 US claimed
EP-0292821-A2 Image reversal process for normally positive photoresists HOECHST AKTIENGESELLSCHAFT (DE) 1988-11-30 EP claimed
US-4775609-A Image reversal HOESCHT CELANESE CORPORATION (US) 1988-10-04 US claimed
EP-0282724-A1 Negative resist compositions International Business Machines Corporation (US) 1988-09-21 EP claimed
EP-0161476-A2 A process for producing a negative tone resist image International Business Machines Corporation (US) 1985-11-21 EP claimed
US-4552833-A Radiation sensitive and oxygen plasma developable resist INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-11-12 US claimed
US-4491628-A TERT-BUTYL ESTERS OR CARBONATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-01-01 US claimed
EP-0102450-A2 Resist compositions International Business Machines Corporation (US) 1984-03-14 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12535738-B2 Photoresist top coating material for etching rate control ALKBH2, TOP2A, KDM2A CYP2C19 833/4885EGFR 399/4885GLA 2680/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.