Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.65 |
| ▸ | MC5R | P33032 | 1/20 | 0.65 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.53 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.49 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.49 |
| ▸ | PTGFR | P43088 | 1/20 | 0.49 |
| ▸ | PTGER3 | P43115 | 1/20 | 0.49 |
| ▸ | PTGER2 | P43116 | 1/20 | 0.49 |
| ▸ | PTGDR | Q13258 | 1/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.48 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.48 |
| ▸ | CTRC | Q99895 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | MPO | P05164 | 1/20 | 0.47 |
| ▸ | HTR2A | P28223 | 1/20 | 0.46 |
| ▸ | HTR2C | P28335 | 1/20 | 0.46 |
| ▸ | HTR2B | P41595 | 1/20 | 0.46 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31509450 | 1.00 | MAPK1 (0.65) | MAPK1MC5RALOX5TBXA2RPTGER4 | |
| SCHEMBL932837 | 0.83 | MC5R (0.63) | MAPK1MC5RCYP1A2CYP2A6CYP2C9 | |
| SCHEMBL31331676 | 0.81 | ALOX5 (0.53) | MAPK1MC5RALOX5TBXA2RPTGER4 | |
| SCHEMBL25403897 | 0.81 | ALOX5 (0.50) | MAPK1MC5RALOX5 | |
| SCHEMBL2516282 | 0.80 | IDH1 (0.55) | ALOX5CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL5778428 | 0.80 | MC5R (0.59) | MAPK1MC5RCYP1A2CYP2A6CYP2C9 | |
| SCHEMBL49863 | 0.80 | CYP1A2 (0.69) | MAPK1MC5RCYP1A2CYP2A6CYP2C9 | |
| SCHEMBL31738884 | 0.79 | CYP2C19 (0.54) | CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL147085 | 0.79 | CYP2C19 (0.54) | CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL5551802 | 0.79 | MC5R (0.58) | MAPK1MC5RTBXA2RPTGER4PTGFR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120045900-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-23 | — | — | US | disclosed |
| EP-0872903-B1 | Method for making hydrogen storage alloy powder and electrode comprising the alloy powder | SHINETSU CHEMICAL CO (JP) | 2001-10-04 | — | — | EP | disclosed |
| US-6277519-B1 | QUENCHING AN ALLOY MELT; COMMINUTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6096144-A | TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| US-5858571-A | TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0872903-A1 | Method for making hydrogen storage alloy powder and electrode comprising the alloy powder | Shin-Etsu Chemical Co., Ltd. (JP) | 1998-10-21 | — | — | EP | disclosed |
| EP-0172427-B1 | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-07-05 | — | — | EP | disclosed |
| US-4758639-A | Process for production of vinyl polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| US-4757124-A | Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-12 | — | — | US | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120045900-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND FULLERENE DERIVATIVE | TOP2A, TOP2B, YWHAE | MAPK1 3936/4885MC5R 4065/4885ALOX5 313/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.