Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | HPGD | P15428 | 3/20 | 0.49 |
| ▸ | MEN1 | O00255 | 3/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | TP53 | P04637 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | PPARG | P37231 | 1/20 | 0.49 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.49 |
| ▸ | ESR1 | P03372 | 5/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TYR | P14679 | 1/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | HTR6 | P50406 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217716 | 0.90 | LMNA (0.53) | TSHRALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL16655607 | 0.90 | TSHR (0.61) | TSHRALDH1A1HPGDMEN1KMT2A | |
| Bisphenol A SCHEMBL50024 | 0.90 | TSHR (0.61) | TSHRALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL791566 | 0.86 | ALDH1A1 (0.69) | TSHRALDH1A1HPGDMEN1KMT2A | |
| Hydroquinone SCHEMBL50263 | 0.86 | TSHR (0.48) | TSHRALDH1A1HPGDMEN1KMT2A | |
| Bisphenol A SCHEMBL1036139 | 0.84 | MEN1 (0.61) | TSHRALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL27028823 | 0.84 | ESR1 (0.59) | TSHRALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL8969745 | 0.84 | TSHR (0.51) | TSHRALDH1A1HPGDMEN1KMT2A | |
| Glycidol SCHEMBL20637749 | 0.83 | ESR1 (0.50) | TSHRALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL29227871 | 0.83 | MEN1 (0.58) | TSHRALDH1A1HPGDMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12030971-B2 | Two-part cyanoacrylate curable adhesive system | HENKEL AG & CO. KGAA (DE) | 2024-07-09 | — | — | US | disclosed |
| WO-2024003053-A1 | METHOD OF UNDERWATER BONDING | HENKEL AG & CO. KGAA (DE) | 2024-01-04 | — | — | WO | disclosed |
| US-20220411645-A1 | RADIATION CURABLE COATING COMPOSITIONS FOR LIGHT FILTERING | ESSILOR INTERNATIONAL (FR) | 2022-12-29 | — | — | US | disclosed |
| CN-114729098-A | Radiation curable coating compositions for optical filtering | 依视路国际公司 | 2022-07-08 | — | — | CN | disclosed |
| US-20210395571-A1 | TWO-PART, CYANOACRYLATE/CATIONICALLY CURABLE ADHESIVE SYSTEMS | HENKEL AG & CO. KGAA (DE) | 2021-12-23 | — | — | US | disclosed |
| US-20210171686-A1 | Two-Part Cyanoacrylate Curable Adhesive System | HENKEL AG & CO. KGAA (DE) | 2021-06-10 | — | — | US | disclosed |
| US-20210147597-A1 | Two-Part Cyanoacrylate Curable Adhesive System | Henkel IP & Holding GmbH (DE) | 2021-05-20 | — | — | US | disclosed |
| US-10921725-B2 | Printing substrates | HP INDIGO B.V. (NL) | 2021-02-16 | — | — | US | disclosed |
| EP-2970718-B1 | TWO-PART, CYANOACRYLATE/CATIONICALLY CURABLE ADHESIVE SYSTEMS | Henkel IP & Holding GmbH (DE) | 2020-04-22 | — | — | EP | disclosed |
| US-20190018333-A1 | PRINTING SUBSTRATES | HP INDIGO B.V. (NL) | 2019-01-17 | — | — | US | disclosed |
| US-20080076886-A1 | Backbones of polyethers, perfluorinated polyethers, polydimethylsiloxanes and hydroxy terminated polybutadienes coupled to phenyl, biphenyl, bisphenol A, bisphenol F, bisphenol S, bisphenol E, allyl, alkyl, alkenyl, carboxy, N-carbamoyl, cyclic amides, epoxy and a thermosetting component; toughening | LOCTITE (R&D) LIMITED | 2008-03-27 | — | — | US | disclosed |
| US-20080064780-A1 | Radiation curable resin composition and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2008-03-13 | — | — | US | disclosed |
| US-7338747-B2 | Photoresist composition and method pattern forming using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2008-03-04 | — | — | US | disclosed |
| US-20070154840-A1 | Radiation curable resin composition and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2007-07-05 | — | — | US | disclosed |
| US-7183040-B2 | Radiation curable resin composition and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2007-02-27 | — | — | US | disclosed |
| EP-1702003-A1 | LASER WELDABLE POLYESTER COMPOSITION AND PROCESS FOR LASER WELDING | E.I. Dupont de Nemours and Company, Inc. (US) | 2006-09-20 | — | — | EP | disclosed |
| US-20050171321-A1 | Laser weldable polyester composition and process for laser welding | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-08-04 | — | — | US | disclosed |
| WO-2005068555-A1 | LASER WELDABLE POLYESTER COMPOSITION AND PROCESS FOR LASER WELDING | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-07-28 | — | — | WO | disclosed |
| US-20040142272-A1 | Photoresist composition and method pattern forming using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2004-07-22 | — | — | US | disclosed |
| US-20040142274-A1 | Radiation curable resin composition and rapid prototyping process using the same | STRATASYS INC. | 2004-07-22 | — | — | US | disclosed |