SCHEMBL7915728

SCHEMBL7915728

C=COC(=O)C(C=Cc1ccccc1)C(=C)Cl

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.41
LMNA P02545 2/20 0.36
HDAC3 O15379 2/20 0.36
HDAC4 P56524 2/20 0.36
HDAC1 Q13547 2/20 0.36
HDAC2 Q92769 2/20 0.36
HDAC8 Q9BY41 2/20 0.36
HDAC6 Q9UBN7 2/20 0.36
TNKS O95271 1/20 0.36
HCAR2 Q8TDS4 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36
HDAC10 Q969S8 1/20 0.36
HDAC11 Q96DB2 1/20 0.36
TNKS2 Q9H2K2 1/20 0.36
HDAC9 Q9UKV0 1/20 0.36
HDAC5 Q9UQL6 1/20 0.36
PLIN1 O60240 1/20 0.36
ALDH1A1 P00352 1/20 0.36
CYP2D6 P10635 1/20 0.36
MAPT P10636 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9640412 0.80 CYP1A2 (0.46) CYP1A2LMNAHDAC3HDAC4HDAC1
SCHEMBL27551457 0.77 CYP1A2 (0.44) CYP1A2LMNAHDAC3HDAC4HDAC1
SCHEMBL10429897 0.73 CYP1A2 (0.41) CYP1A2LMNAHDAC3HDAC4HDAC1
SCHEMBL9514036 0.71
SCHEMBL28745785 0.70 CYP3A4 (0.38) CYP1A2LMNAHDAC3HDAC4HDAC1
SCHEMBL4962444 0.70 CYP1A2 (0.37) CYP1A2LMNAHDAC3HDAC4HDAC1
SCHEMBL2636177 0.69 CYP1A2 (0.62) CYP1A2LMNAHDAC3HDAC4HDAC1
SCHEMBL28154170 0.69 PAM (0.45) LMNAAKR1B10AKR1B1PAMMMP1
SCHEMBL9281647 0.68 CYP1A2 (0.51) CYP1A2LMNAHDAC3HDAC4HDAC1
Butadiene SCHEMBL11548723 0.68 CYP1A2 (0.47) CYP1A2LMNAHDAC3HDAC4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101324752-B Method for preparing polymer LCD photosensitive material capable of recording reflection holography SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2012-07-25 CN claimed
CN-101320208-B Reflection holography thin film and preparation method thereof SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2011-06-01 CN claimed
CN-101034257-B Photosensitive film used for holographic recording and manufacturing method SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2010-09-08 CN claimed
CN-101324752-A Method for preparing polymer LCD photosensitive material capable of recording reflection holography SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2008-12-17 CN claimed
CN-101320208-A Reflection holography thin film and preparation method thereof SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2008-12-10 CN claimed
CN-101034257-A Photosensitive film used for holographic recording and manufacturing method SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2007-09-12 CN claimed
CN-101324752-B Method for preparing polymer LCD photosensitive material capable of recording reflection holography SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2012-07-25 CN disclosed
CN-101320208-B Reflection holography thin film and preparation method thereof SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2011-06-01 CN disclosed
CN-101034257-B Photosensitive film used for holographic recording and manufacturing method SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2010-09-08 CN disclosed
CN-101059654-B Photolithagraphic diffractive image false-proof film and its preparation method SHANGHAI FUDAN TECHSUN NEW TECHNOLOGY CO LTD 2010-05-19 CN disclosed
CN-101324752-A Method for preparing polymer LCD photosensitive material capable of recording reflection holography SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2008-12-17 CN disclosed
CN-101320208-A Reflection holography thin film and preparation method thereof SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2008-12-10 CN disclosed
CN-101059654-A Photolithagraphic diffractive image false-proof film and its preparation method SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2007-10-24 CN disclosed
CN-101034257-A Photosensitive film used for holographic recording and manufacturing method SHANGHAI FUDAN TECHSUN NEW TEC (CN) 2007-09-12 CN disclosed
US-6211894-B1 Image forming method KONICA CORPORATION (JP) 2001-04-03 US disclosed
EP-0858908-B1 Image forming method using metal chelates KONISHIROKU PHOTO IND (JP) 2000-11-29 EP disclosed
US-6040267-A Image forming method KONICA CORPORATION (JP) 2000-03-21 US disclosed
EP-0858908-A1 Image forming method using metal chelates KONICA CORPORATION (JP) 1998-08-19 EP disclosed