SCHEMBL7925912

SCHEMBL7925912

CCCC(=O)O[Ti](OC(=O)CCC)(OC(=O)CCC)OC(=O)CCC

nearest known ligand 0.57

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.57
CES2 O00748 3/20 0.43
CES1 P23141 3/20 0.43
HDAC3 O15379 4/20 0.41
HDAC1 Q13547 4/20 0.41
HDAC2 Q92769 4/20 0.41
HDAC8 Q9BY41 4/20 0.41
FFAR3 O14843 3/20 0.41
TSHR P16473 3/20 0.39
HDAC6 Q9UBN7 1/20 0.36
CTSD P07339 1/20 0.35
DGKA P23743 1/20 0.34
LMNA P02545 3/20 0.34
BCL9 O00512 1/20 0.33
CTNNB1 P35222 1/20 0.33
MGAM O43451 1/20 0.32
GAA P10253 1/20 0.32
SI P14410 1/20 0.32
MGAM2 Q2M2H8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10777463 0.85 ALDH1A1 (0.48) ALDH1A1CES2CES1HDAC3HDAC1
SCHEMBL10773440 0.84 CES1 (0.48) ALDH1A1CES2CES1TSHRDGKA
SCHEMBL10773421 0.82 ALDH1A1 (0.44) ALDH1A1CES2CES1HDAC3HDAC1
SCHEMBL16394633 0.80 DGKA (0.59) ALDH1A1CES2CES1TSHRDGKA
SCHEMBL19177142 0.80 DGKA (0.59) ALDH1A1CES2CES1TSHRDGKA
SCHEMBL1608798 0.80 DGKA (0.59) ALDH1A1CES2CES1TSHRDGKA
SCHEMBL7938717 0.80 DGKA (0.59) ALDH1A1CES2CES1TSHRDGKA
SCHEMBL10779833 0.79 ALDH1A1 (0.52) ALDH1A1CES2CES1HDAC3HDAC1
SCHEMBL10777450 0.79 ALDH1A1 (0.52) ALDH1A1CES2CES1HDAC3HDAC1
SCHEMBL10773426 0.79 ALDH1A1 (0.41) ALDH1A1CES2CES1HDAC3HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9093279-B2 Thin film forming composition for lithography containing titanium and silicon NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-07-28 US disclosed
EP-2735904-A1 THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON Nissan Chemical Industries, Ltd. (JP) 2014-05-28 EP disclosed
US-20140120730-A1 THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-01 US disclosed
EP-0867454-B1 POLYMERIZATION CATALYST AND PROCESS FOR PRODUCING POLYMERS IDEMITSU KOSAN CO (JP) 2001-03-21 EP disclosed
US-6075102-A Polymerization catalyst and process for producing polymers IDEMITSU KOSAN CO., LTD. (JP) 2000-06-13 US disclosed
EP-0867454-A1 POLYMERIZATION CATALYST AND PROCESS FOR PRODUCING POLYMERS IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-09-30 EP disclosed
EP-0240952-A2 A method for producing a flaky material SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-10-14 EP disclosed