SCHEMBL79285

SCHEMBL79285

OCCN(CCO)C1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.39
CYP2D6 P10635 6/20 0.37
CYP2C9 P11712 3/20 0.37
HSD17B10 Q99714 2/20 0.37
TSHR P16473 1/20 0.37
PHGDH O43175 1/20 0.34
ADH1A P07327 2/20 0.34
ALDH1A1 P00352 2/20 0.34
CYP1A2 P05177 4/20 0.34
CYP2C19 P33261 3/20 0.34
HIF1A Q16665 2/20 0.34
JAK2 O60674 1/20 0.34
JAK1 P23458 1/20 0.34
TYK2 P29597 1/20 0.34
OPRM1 P35372 2/20 0.33
OPRD1 P41143 2/20 0.33
OPRK1 P41145 2/20 0.33
SLC29A1 Q99808 1/20 0.33
FDPS P14324 1/20 0.32
ADH1C P00326 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6567107 1.00 LTA4H (0.39) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL11787675 0.97 LTA4H (0.38) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL9320360 0.97 LTA4H (0.38) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL522366 0.97 LTA4H (0.37) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL3429371 0.95 OPRM1 (0.35) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL11209044 0.91 LTA4H (0.36) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL4383611 0.89 LTA4H (0.35) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL3431246 0.89 LTA4H (0.35) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL3426360 0.88 LTA4H (0.34) LTA4HCYP2D6CYP2C9HSD17B10TSHR
SCHEMBL22749520 0.87 MAPT (0.42) LTA4HCYP2D6CYP2C9HSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5298 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250368845-A1 LOW-VISCOSITY FLUX COMPOSITION FOR PRINTING USING DIGITAL INKJET HEAD JETBEST CORP (TW) 2025-12-04 US claimed
US-12359125-B2 Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-15 US claimed
CN-120025793-A Cooling liquid and preparation method thereof 江苏龙蟠新材料科技有限公司 2025-05-23 CN claimed
CN-119926122-A Carbon dioxide trapping agent and application thereof in trapping carbon dioxide in flue gas 四川精事达科技有限公司 2025-05-06 CN claimed
US-20250026960-A1 POLISHING SLURRY COMPOSITION KCTECH CO.,LTD. (KR) 2025-01-23 US claimed
CN-119020117-A Composition and method for removing post-ashing residue from semiconductor substrates 芯仕达电子材料(昆山)有限公司 2024-11-26 CN claimed
CN-118995223-A High performance selective etching solution for silicon in silicon germanium/silicon laminate 湖北兴福电子材料股份有限公司 2024-11-22 CN claimed
CN-118853270-A Copper alloy metal processing liquid and preparation method thereof 宁波市北仑润轴特种油品科技有限公司 2024-10-29 CN claimed
US-12128350-B2 Water-lean carbon dioxide absorbent and method for capturing carbon dioxide by using same CE-TEK CO., LTD. (KR) 2024-10-29 US claimed
EP-3684887-B1 ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE VERSUM MAT US LLC (US) 2024-09-25 EP claimed
EP-0332441-A2 Permanent antistatic resin composition MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1989-09-13 EP claimed
US-4770816-A N,N-BIS/2-HYDROXYETHYL/CYCLOHEXYLAMINE STABILIZER MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1988-09-13 US claimed
US-4759861-A Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt NIPPON OIL CO., LTD. (JP) 1988-07-26 US claimed
US-4734449-A POLYOLEFIN STABILIZERS AGAINST LIGHT DECOMPOSITION CIBA-GEIGY CORPORATION (US) 1988-03-29 US claimed
EP-0140297-A2 Thiocarbamic-acid esters as stabilizers CIBA-GEIGY AG (CH) 1985-05-08 EP claimed
US-4247485-A Process for the preparation of 2,2-dimethylolalkanals BAYER AKTIENGESELLSCHAFT (DE) 1981-01-27 US claimed
US-4233247-A Process for the preparation of 2,2-dimethylolalkanals BAYER AKTIENGESELLSCHAFT (DE) 1980-11-11 US claimed
US-4219626-A Accelerators for radical polymerization reactions with initiators free from peroxide groups BAYER AKTIENGESELLSCHAFT (DE) 1980-08-26 US claimed
US-3968104-A SOLVENTS BAYER AKTIENGESELLSCHAFT (DT) 1976-07-06 US claimed
US-3937753-A FIBERS, FILMS, FABRICS, BLOCK COPOLYMER THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-02-10 US claimed